SF-100 Rotational Stage Assembly Provides MicroPatterning of Cylindrical Surfaces
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St. Petersburg, Florida, October 24, 2006: Intelligent Micro Patterning, LLC, St. Petersburg, Florida, announced a new, unique enhancement to the SF-100 maskless micropatterning system, termed the SF-100 Rotational Stage Assembly. This additional capability allows for micro patterning of features seamlessly on cylindrical curved surfaces. The SF-100 is a unique, maskless photolithography system that utilizes patented Smart Filter technology, licensed by Intelligent Micro Patterning, LLC from the University of South Florida. Smart Filter technology incorporates proprietary, cutting-edge, micro-optical techniques to rapidly project master images directly onto diverse substrate materials, such as quartz, ceramics, metals, and plastics, without the use of photomasks.
Dr. Jay Sasserath, the Company's Chief Executive Officer, stated, "This is a very unique enhancement to the SF-100 system. The Rotational Substrate Stage provides highly controllable and repeatable patterning of cylindrical substrates using standard photolithography techniques and materials. Additionally, through the integration of the Rotational Substrate Stage with the SF-100 Auto Stage, true one button, seamless patterning is available. Features as small as 10 microns have been patterned successfully using this technique. Applications for this technology have been demonstrated in various market areas, including military/ defense, biotechnology, aerospace, and print head fabrication."
More details on this product enhancement can be found by downloading the SF-100 Rotational Substrate Stage brochure from the Downloads page of the Intelligent Micro Patterning website, www.intelligentmp.com/Downloads.htm.
Intelligent Micro Patterning, LLC
Jay Sasserath
CEO
email: jays@intelligentmp.com
phone: 727-522-0334
For More Information, see the Intelligent Micro Patterning Website at www.intelligentmp.com
