ReVera Retires the RVX 1000(TM), the Semiconductor Industry's First Production Capable XPS System
Santa Clara, CA - ReVera will discontinue the RVX 1000, effective December 31, 2012. The RVX 1000, ReVera's first product, has been in service for over eight years and was originally developed to qualify transistor gate oxides, such as plasma SiON, and rapidly became the first production metrology tool to measure film composition. The product was also the first production-capable platform to use X-Ray Photoelectron Spectroscopy (XPS), an essential materials analysis technology previously only available to the most sophisticated materials research teams in analytical laboratories.
ReVera has subsequently developed two generations of products, each with increasing capability and applications benefit. The VeraFlex II, ReVera's latest product, is used extensively to control film thickness and composition for both logic and memory devices. The VeraFlex II is the standard metrology platform for High K - Metal Gate (HKMG) film process control on product wafers and is used by all foundry manufacturers at the 3xnm and 2xnm technology nodes. The product is also used extensively by advanced node DRAM and Flash manufacturers to control tunnel oxides, capacitor films and other critical applications.
"While we are retiring the RVX 1000 after a long and successful life, the markets for our new products are growing every year," commented Tom Larson, Vice President of Marketing at ReVera. "The increasing challenges of device yield at the 2xnm node and below have required our customers to implement comprehensive, in-line composition and multi-layer thickness metrology solutions in order to get better correlation to device performance. Traditional metrology approaches are now struggling to deliver viable solutions in this regime but our unique XPS based technology, which directly measures the most important film properties, provides accurate, reliable and unambiguous results.
ReVera Incorporated is the leader in composition and film thickness metrology for complex, multi-layer film stacks for advanced node semiconductor manufacturing. Its products are used by device manufacturers worldwide to measure, monitor and control critical device layers in high-volume production and to enable rapid development and control of complex, new processes. ReVera products set the standard for High K - Metal Gate, tunnel oxide and capacitor film metrology. ReVera is backed by a global network of support partners and an experienced staff of engineers, scientists, applications, field service, sales and logistics personnel.
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