Precursor Source System suits ALD mass production.

Press Release Summary:



Equipped with Atomic Layer Deposition valves that can be heated to over 400°C, Picohot™ 400 enables efficient delivery of both solid and liquid low volatility chemicals in large doses optimal for batch processing. Source is especially suitable for metal chloride precursors, ensuring particle-free processing of hafnium oxide and many other materials on up to 300 mm wafers. Large internal volume of source container guarantees long, continuous process uptime with effective precursor utilization.



Original Press Release:



New Precursor Sources for ALD Mass Production from Picosun



ESPOO, Finland, -- Picosun Oy, leading supplier of industrial scale Atomic Layer Deposition (ALD) thin film coating solutions, now offers its customers an extensive range of new precursor sources especially designed for high volume manufacturing.



The now launched Picohot(TM) 400 source system is the latest addition to Picosun's highly sought-after product line of production-compatible high temperature sources. The Picohot(TM) 400 source system's ALD valves can be heated up to over 400oC to enable efficient delivery of both solid and liquid very low volatility chemicals in large doses optimal for batch processing. The source is especially suitable for metal chloride precursors, ensuring particle-free processing of e.g. hafnium oxide and many other materials on up to 300 mm wafers. The large internal volume of the source container guarantees long, continuous process uptime with effective precursor utilization and minimized number of service breaks. A separate, production-compatible purge valve speeds up the maintenance procedures even further.



Picosun's industry-scale precursor delivery solutions are further complemented by a temperature-stabilized, high volume Picosolution(TM) 2000 source system for up to two liters of liquid precursor chemicals.



"As the number of industrial ALD applications keeps booming there is a growing need to widen the selection of precursor chemicals. Precursors for several important production processes only exist as solids or low volatility liquids. Our leading experience in ALD system design now enables the first, true production-scale high temperature source systems designed solely based on the requirements of the ALD method and fulfilling the strictest quality standards of the semiconductor industries. We are pleased to provide our customers with these systems to make their most advanced novel products come true in high manufacturing volumes," states Mr. Juhana Kostamo, Managing Director of Picosun.



Picosun provides the most advanced ALD thin film technology and enables the industrial leap into the future by novel, cutting-edge coating solutions, with four decades of continuous expertise in the field. Today, PICOSUN(TM) ALD systems are in daily production use in numerous major industries around the world. Picosun is based in Finland, with subsidiaries in North America, China, Taiwan, Singapore, and Japan, and a world-wide sales and support network. 



Juhana Kostamo, Managing Director, email juhana.kostamo@picosun.com; tel. +358-50-321-1955

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