Carson City, NV - Plasma Etch Inc, a leader in plasma treatment, will be providing live demonstrations of two of the company’s most popular products to attendees at the Med Tech World MD&M West 2018 trade show. Company representatives will be giving demonstrations of the company’s popular PE-50 plasma cleaner along with the Plasma Wand. The show runs February 6 – 8 at the Anaheim Convention Center in Anaheim, California.
Company representatives will be on hand to answer questions and provide live demonstrations. This is a great opportunity for medical design manufacturers to get their hands on a Plasma Wand or PE-50 plasma cleaner. Attendees are encouraged to bring their own samples to the demonstration for cleaning. The demonstrations will be performed at booth number 2060.
The PE-50 is an affordable, entry level option for most types of plasma treatment. This unit is very popular at universities and research labs. Plasma Etch credits the PE-50’s success to its versatility and robust design. The PE-50 features simple controls and easy to read indicators for monitoring the plasma processing sequence.
The Plasma Wand is an exciting product the company introduced last year to meet the need for a convenient, hand held plasma product for spot cleaning and research work. It’s about the size of an electric toothbrush and requires only electricity to operate; no input gas needed. The Plasma Wand provides atmospheric plasma capable of increasing bond strength and printability of most surfaces.
If you don’t make it to the show, you can view all of Plasma Etch’s innovative products anytime on their website: www.plasmaetch.com
About Plasma Etch: Plasma Etch has been a leading manufacturer and industry innovator since 1980. The company holds several patents for the invention, development and manufacturing of groundbreaking innovations, paving the way for plasma technology and the enhancement of quality manufacturing worldwide. Plasma Etch specializes in plasma cleaning solutions of all sizes. Their products are industry proven and set the standard for reliability, speed and uniformity in plasma processing.