Nanotechnology System enables nanolithography.

Press Release Summary:




NanoMan(TM) combines Dimension Series platform SPM/AFMs with NanoScope® IV SPM controller and Dimension CL Closed-Loop Scanner Head. It includes user interface and software for intuitive operation in moving objects at nanometer and molecular levels. NanoMan provides censored scanning for sub-micron scan sizes.



Original Press Release:



Advanced Nanotechnology System Enables Easy Nanomanipulation and Nanolithography



Santa Barbara, CA, December 10, 2001 - As part of its ongoing development of enabling tools for nanoscience and nanotechnology, Digital Instruments, Veeco Metrology Group announces the new NanoMan(TM) Nanomanipulation and Nanolithography System. This new system combines the field-proven
stability and reliability of the Dimension Series platform SPM/AFMs, with the revolutionary NanoScope® IV SPM controller and new Dimension CL Closed-Loop Scanner Head. This combination offers 10X faster scanning, high accuracy and repeatability in X-Y positioning, and the most advanced nanomanipulation system available on the market today.

Also included is the new user interface and software for intuitive operation in moving objects at the nanometer and molecular levels. The new NanoMan system offers the lowest noise floor available today and exclusively provides censored scanning for sub-micon scan sizes.

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