Press Release Summary:
Available in white polypropylene or stainless steel, wet cleaning bench can be used for processing such semiconductor components as silicon wafers and solar cells. Modules that can be used as needed include cleaning bench with sink, gravity drain, spray nozzles, and gooseneck faucet. Overhead bi-directional filtered exhaust system can also be added to remove harmful fumes. Vertical laminar flow station features control pad with usability-optimized interface.
Original Press Release:
Modular Wet Cleaning Station
Fullerton, CA – This economical wet cleaning bench from Terra Universal is ideal for processing semiconductor components like silicon wafers and solar cells. Use the modules you need: the cleaning bench with sink, gravity drain, spray nozzles and gooseneck faucet, or add an overhead bi-directional filtered exhaust system to remove harmful fumes.
The vertical laminar flow station features a control pad with easy-to-use interface; monitor and control light, fan/filter unit backpressure and air speed. The sink and work surface are perforated to safely collect liquid run-off, and a raised lip along the counter prevents spills. Install and store a carboy in the cabinet space below, to safely collect fluid.
A transparent front sash in the vertical laminar flow station protects personnel from fumes and splashes while the fluorescent light module illuminates the surface. Back baffles are adjustable to control air speed, direction and volume. Cleaning stations come in white polypropylene (best for acids) or stainless steel (designed for use with solvents).
Terra Universal has 40-years of experience manufacturing wet processing benches and semiconductor manufacturing equipment. For more information about Wet Cleaning Stations, visit Terra’s website.