Microanalysis Software includes Free Draw feature.
Press Release Summary:
GENESIS v3.6 includes Phase Cluster Analysis (PCA) and Gun Shot Residue (GSR) features. PCA option provides statistical analysis for spectral mapping data and allows user to automatically find phases in recorded data. GSR option utilizes Phase Particle software capabilities with application specific functions and includes auto calibration of thresholds in back scattered signal. Free draw consists of free standing scanning defined by free hand drawing on image.
Original Press Release:
Edax Releases Enhanced Version Of Genesis 3.6 Microanalysis Software
Mahwah, NJ - EDAX Inc., a leader in X-ray microanalysis, X-ray fluorescence and electron diffraction instrumentation, has introduced the next generation of its GENESIS EDS Microanalysis software.
"The latest version of GENESIS 3.6 software includes new innovative features, including PCA (Phase Cluster Analysis) GSR (Gun Shot Residue) and Free Draw," explains Del Redfern, Materials Characterization Product Manager for EDAX.
"Our GENESIS program is the industry's leading microanalysis software. Many of the new features and enhancements of existing features result from the positive feedback we received from current GENESIS users," he adds.
"The PCA option is the next generation of statistical analysis for spectral mapping data," notes Redfern. "It allows the user to automatically find phases in the recorded data, by clustering spectra at each pixel based on similarity in the channels counts. Phase Maps can be built using a phase library, associating a color to each pixel in the image based on the closest found phase in the library and the goodness of fit."
"The GSR option within GENESIS utilizes the powerful Phase Particle software capabilities with application specific functions for the GSR users, such as class libraries, ternary diagrams, data and particle retrieval and reporting writing," states Redfern.
"GENESIS GSR also includes auto calibration of the thresholds in the back scattered signal to ensure any drift in the signal does not effect the analysis," comments Redfern.
"Free draw is an enhancement to the Spectrum acquisition capabilities of GENESIS 3.6. It is a new mode of free standing scanning defined by free hand drawing on the image, allowing the user to scan a selected area for spectrum. The selected area is shown in overlay graphics on top of the image and is available in printouts as well as for image annotation," he adds.
EDAX is the acknowledged leader in Energy Dispersive Microanalysis, X-ray Fluorescence and Electron BackScatter Diffraction instrumentation. It designs, manufactures, installs and services high-quality products and systems for leading companies in the semiconductor, metals, geological, biological, material and ceramics markets.
Since it's founding in 1962, EDAX has used its knowledge and experience to develop ultra-sensitive silicon radiation sensors, digital electronics and specialized application software that facilitate solutions to research, development and industrial requirements.
EDAX is a unit of AMETEK Process & Analytical Instruments. AMETEK, Inc., is a leading global manufacturer of electronic instruments and electric motors with annual sales of more than $1billion.
For further information about EDAX, contact us at:
EDAX Inc.
91 McKee Drive, Mahwah, NJ 07430
Tel: (201) 529-4880 o Fax: (201) 529-3156
E-mail: edax.info-americas@ametek.com o edax.info-international@ametek.com
Website: www.edax.com
