Press Release Summary:
Identifying changes and irregularities in film microstructure, Crystalx II(TM) wide angle X-ray diffraction metrology system provides quick quantitative full wafer measurements of crystallographic texture, phase, and relative grain size. Suitable for process development and production, monitoring tool uses 2D area detector for collection of multiple diffraction peaks at multiple angles simultaneously, resulting in rapid microstructure data collection.
Original Press Release:
Nova Measuring Instruments Expands Offering with the Introduction of Crystalx II(TM), a Wide Angle X-Ray Diffraction Metrology System
REHOVOT, Israel, December 4/ -- Nova Measuring Instruments Ltd. (NASDAQ: NVMI ), the market leader in integrated measurement and process control for the semiconductor industry, today announced the introduction of a new metrology platform, the CrystalX II(TM) - a Wide Angle X-ray Diffraction metrology system.CrystalX II(TM) answers one of the most critical requirements of IC
manufacturing for measurements that provide insight into electrical
performance of semiconductor devices. The system quickly identifies changes
and irregularities in film microstructure that degrade device performance,
reliability and yield - variations that are undetected by other metrology
CrystalX II(TM) is the first microstructure monitoring tool that can be
used both in process development and in production. CrystalX II(TM) provides
quick, quantitative full wafer measurements of crystallographic texture,
phase and relative grain size. The system uses a 2-dimensional area detector
allowing for the collection of multiple diffraction peaks at multiple angles
simultaneously, resulting in rapid microstructure data collection. The
system's architecture allows the detector, X-ray source and wafer to be
completely fixed during measurement, providing both high measurement speed
and the high positional certainty necessary to measure blanket and product
Commenting on the new Product announcement, Dave Kurtz, Nova Vice
President and head of Nova's Microstructure Business Unit, said, "Looking
into the crystallographic microstructure is not just an occasional analytical
need but is an essential part of process development and process monitoring
both for new Front End Of Line applications like Nickel Silicide and for Back
End Of Line applications such as Copper or Tungsten interconnects. Our WA-XRD
technology has already proven itself in R&D and Production environments, and
we are excited about extending its adoption for a variety of new applications
for in-line monitoring of Semiconductor manufacturing."
Nova Measuring Instruments Ltd. develops, designs and produces
integrated process control systems in the semiconductor manufacturing
industry. Nova provides a broad range of integrated process control solutions
that link between different semiconductor processes and process equipment.
The Company's website is www.nova.co.il.
Source: Nova Measuring Instruments Ltd