Laser Cutting System suits laboratory applications.

Press Release Summary:

Based on Nd:YAG resonator, air-cooled EzLaze 3 mounts on most industrial microscopes, delivering laser energy to 2.5 mJ at 1,064 and 532 nm, or up to 0.6 mJ at 355 and 266 nm. Variable spot size and optical attenuator enable precise control of energy, while high-resolution shutter facilitates precise control of cut. Internal spot marker replaces external incandescent spot marker with blue-LED system. Motorized polarizer allows beam to be tailored for interfacing equipment.


Original Press Release:

New Wave Research Launches Next-Generation Laboratory Laser-Cutting System

Enhanced EzLaze 3 Laser-Cutting System builds on EzLaze II legacy Boston, Mass., May 23, 2005 - New Wave Research, a leading manufacturer of laser-based systems for flat-panel display repair, semiconductor failure analysis and micromachining, today launches the EzLaze 3 Laser Cutting System. It is the fourth-generation development of New Wave Research's line of air-cooled, microscope-mounted lasers, of which more than 850 have been produced since 1997. The EzLaze product line mounts on most major brands of industrial microscopes and is used throughout the semiconductor industry in failure analysis and LCD repair applications to remove discrete layers of material and cut traces. Its entirely air-cooled architecture eliminates the bulk, weight and maintenance requirements of a water-cooling system and complements the higher repetition-rate QuikLaze system. Based on a compact Nd:YAG resonator, the EzLaze 3 delivers laser energy up to 2.5 mJ at 1064 nm and 532 nm or up to 0.6 mJ at 355 nm and 266 nm. It has a variable spot size and an optical attenuator that allows precise control of the delivered energy while maintaining optimal beam characteristics. The EzLaze 3 builds on the success of the EzLaze II system by adding and replacing several key features: the system provides higher pulse energy, increased beam stability and a higher sustained repetition rate for greater throughput and accuracy. A high-resolution shutter offers more precise control of the cut. An internal spot marker replaces the clutter of an external incandescent spot marker with a longer lasting, blue-LED system. (An optional external incandescent spot marker is also available.) Additionally, a motorized polarizer allows the beam to be tailored for interfacing equipment. The EzLaze 3 is available with a range of microscopes, stages and accessories to create a complete laser-cutting station. The standard configuration consists of a Class IIIb laser product. Also available are Class IV and de-rated Class I versions, plus an optional Class I enclosure that enables operation of even the highest-energy versions in an unrestricted environment. The EzLaze 3 will be featured at SID Symposium booth #800, May 24-26 in Boston, Massachusetts. For more information, contact lasers@new-wave.com or call (510) 249-1550. Web: www.new-wave.com Established in 1990, New Wave Research is a global leader in the development of high-quality laser-based systems and modules for the microelectronics and analytical instrumentation industries. The company manufactures lasers for wafer scribing, flat-panel display repair, semiconductor failure analysis, micromachining, particle image velocimetry, laser ablation/solid sampling for ICP/ICP MS and general-purpose lasers for OEM and scientific applications.

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