2006-09-16--Heidelberg, Germany, September 16, 2006: Heidelberg Instruments announced the sale of an advanced DWL200 maskless laser lithography system to the Institute of Electron Technology Warsaw, Poland.
The DWL200 system will enable the user to expose minimum structures on photoresist down to 0.6 microns, with an active write area of up to 200 mm by 200 mm.
"The DWL200 maskless lithography system for mask writing and direct writing on silicon substrates will be installed in the Institute of Electron Technology (ITE) in Warsaw, Poland. Its primary role will be in fast model development and prototyping as used for specialized micro devices and micro systems MEMS/MOEMS. The fast prototyping is the key issue in the field of MEMS/MOEMS and the DWL200 maskless lithography system makes prototyping much faster than by use of classical lithography " states Dr. Piotr Grabiec, Head of the Silicon Microsystem and Nanostructure Technology Department.
Institute of Electron Technology (ITE), Warsaw, Poland: The mission of the ITE is to conduct the basic and applied research in the field of semiconductor electronics and physics in order to develop and commercialize innovative micro- and nano-technologies and their applications in semiconductor microelectronics, optoelectronics, photonics and micromechanics. Founded in 1966, the institute currently employs 288 workers specializing in electronics, physics, chemistry and material technology. The ITE established two Centers of Excellence: CEPHONA (Physics and Technology of Photonic Nanostructures) and MANTARC (Micro- and Nanotechnology Applied Research Center) to assist Polish and European communities in introducing new technologies and to increase the competitiveness of European Research Area. The investment for the DWL200 is financed within the Sectoral Operational Programme "Improvement of the Competitiveness of Enterprises, years 2004-2006" in the framework of Structural Funds following accession of Poland to the European Union.
About Heidelberg Instruments, GmbH: With an installation base of more than 250 systems in over 30 countries, Heidelberg Instruments is a world leader in production of high precision maskless lithography systems. These systems are used for direct writing and photomask production by some of the most prestigious universities and industry leaders in the areas of MEMS, BioMEMS, Nano Technology, ASICS, TFT, Plasma Displays, Micro Optics, and many other related applications.
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