Press Release Summary:
Model HP2 helium purifier provides point-of-use purification of helium or other noble gases to sub-ppm levels of impurities. Model NP2 purifies nitrogen to sub-ppm levels of gaseous impurities. Purification substrate in both gas purifiers is non-evaporable gettering alloy, contained in welded assembly. Self-regulating design eliminates thermal runaway, and maintains getter material at optimal temperature.
Original Press Release:
Helium and Nitrogen Purifiers
Carrier gas purity is essential in any application requiring extreme sensitivity. Impurities limit detector sensitivity and can even destroy capillary columns. The Valco HP2 helium purifier provides "point-of-use" purification of helium or other noble gases to sub-ppm levels of impurities. The NP2 (nitrogen purifier) is similar, purifying nitrogen to sub-ppm levels of gaseous impurities.
The purification substrate in Valco gas purifiers is a non-evaporable gettering alloy. This stable alloy is contained in a welded assembly, so the purifiers can be used safely in industrial applications with minimal precautions.
The helium and nitrogen purifiers feature a self-regulating design which eliminates the possibility of thermal runaway and maintains the getter material at the optimum temperature.