Press Release Summary:
The Extreme Ultraviolet Flat Mirrors are offered in 5° and 45° AOI versions with ideal reflectivity at 13.5 nm. The units come with multi-layer, metal/semi-conductor coating. The 45° AOI mirrors are suitable for steering s-polarized beams whereas the 5° AOI mirrors are used with unpolarized beams. The mirrors come with a surface flatness of λ/10 at 632.8 nm and 6.35 mm thickness. They reduce the scatter of incident light and are designed for EUV beam steering and harmonic separation applications.
Original Press Release:
Extreme Ultraviolet (EUV) Flat Mirrors for 13.5 nm Available for Immediate Delivery
Ideal for beam steering and materials science research
October 4, 2018, Barrington, NJ, USA - Edmund Optics® (EO), the premier provider of optical components, introduces Extreme Ultraviolet (EUV) Flat Mirrors. These precision polished, multi-layer mirrors are designed for maximum achievable reflectance at the design wavelength and Angle of Incidence (AOI). They are designed for EUV beam steering and harmonic separation applications.
Maximum achievable reflection at 13.5nm
Extreme Ultraviolet (EUV) Flat Mirrors are available in 5° and 45° AOI versions and feature nearly ideal reflectivity at 13.5nm, the wavelength of highest reflectivity available in the EUV spectrum. The RoHS compliant mirrors offer a coating deposited on a super-polished single crystal silicon substrate for superior thermal stability. Exhibiting a surface roughness less than 3A RMS, these EUV mirrors greatly reduce scatter of incident light. The multi-layer, metal/semi-conductor coating includes a Mo/Si multilayer with a Si top layer. With a surface flatness of λ/10 at 632.8nm and 6.35mm thickness, the 45° AOI mirrors are ideal for steering s-polarized beams, while the 5° AOI mirrors are excellent for use with unpolarized beams.
Ideal for CDI and materials science research
Extreme Ultraviolet (EUV) Flat Mirrors are used for emerging applications such as Coherent Diffractive Imaging (CDI) and materials science research. CDI is a non-contact imaging technique, capable of achieving resolutions approaching 10nm and is commonly used to analyze extremely small nanofabricated structures. The mirrors are also used as harmonic selectors for High Harmonic Generation (HHG) beams. Extreme Ultraviolet (EUV) Flat Mirrors are in-stock and available for immediate delivery.
Edmund Optics®is a leading supplier of optics, imaging, and photonics technology for the Life Sciences, Biomedical, Semiconductor, R&D, and Defense markets around the globe. EO designs and manufactures a wide array of multi-element lenses, lens coatings, imaging systems, and optomechanical equipment, while supporting OEM applications with volume production of both stock and custom products. EO's state-of-the-art manufacturing capabilities, combined with its global distribution network, has earned it the position of the world's largest supplier of off-the-shelf optical components. Customers can purchase items by calling 1-800-363-1992, via the catalog or the website at www.edmundoptics.com.
Media Relations/Content Marketing
Assistant Marketing Manager
Edmund Optics®, Inc.
101 East Gloucester Pike
Barrington, NJ 08007 U.S.A.