EDA Software migrates designs to 28 and 20 nm technologies.

Press Release Summary:



Based on 2-dimensional, automated, dynamic layout compaction technology, nmigrate(TM) makes all necessary corrections to layout to enforce complex must-abide-by rules for 28 nm and 20 nm process technologies and below. Cost function system optimizes layout for yield, variability, reliability, and other design metrics. Accelerated time to solution is enabled by scalable automatic optimization of all layout requirements.



Original Press Release:



Sagantec Announces nmigrate(TM)



Migration and DRC correction tool for advanced nanometer technologies

SANTA CLARA, Calif., -- Sagantec announced today its nmigrate layout migration and optimization tool specifically developed for 28nm and 20nm technology rules. nmigrate is based on the patented 2D dynamic compaction technology developed by NP-Komplete Technologies, whose acquisition Sagantec announced earlier this month. nmigrate has already been used successfully by several tier-1 semiconductor companies.

The nmigrate tool is based on two-dimensional, automated, dynamic layout compaction technology. It makes all necessary corrections to a layout to enforce complex, must-abide-by rules for 28nm and 20nm process technologies and below.

"Today's 28nm and 20nm technologies present many new and tougher challenges for physical implementation. A library that is competitive from density, routability, reliability and variability perspectives and at the same time respects all new technology design rules is very hard to design manually in a timely manner. Furthermore, frequent changes and updates to new technology design rules make it even more challenging to keep up with manually," explained Coby Zelnik, Sagantec's president and CEO. "nmigrate is an automatic layout migration, compaction and optimization solution that is proven to successfully handle all these requirements and updates, delivering optimal results that are design rule clean," Zelnik concluded.

Product Capabilities

nmigrate can migrate and DRC-correct cell layout and make sure the layout adheres to all advanced design rules, including coloring for double patterning. The key benefits offered by nmigrate are:

-- Higher quality layout, enabled by its 2d native engine and optimized handling of composite rules

-- Faster time to solution, enabled by scalable automatic optimization of all layout requirements

The nmigrate tool has already been used successfully by several tier-1 semiconductor companies, and used with multiple cell libraries targeting multiple leading-edge 28nm and 20nm foundry processes.

Availability

nmigrate is already available for customers who design or migrate libraries for 28nm and 20nm processes. Sagantec offers both software license model as well as a service model.

At DAC'12

Sagantec will present and demonstrate nmigrate at this year's Design Automation Conference, June 4-6 in San Francisco, CA at booth number 1402.

About Sagantec

Sagantec's process migration tools are used to retarget semiconductor designs to either the next technology node or to a different process at the same or previous technology node, down to 20 nm. Privately held and funded, its corporate headquarters is at 2075 De La Cruz Blvd., Santa Clara, CA 95050. Telephone: (408) 727-6290 Fax: (408) 727-6288. On the Web at: www.sagantec.com

note: nmigrate is a trademark of Sagantec North America, Inc.

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