DEK, the world's leading mass imaging equipment supplier, will be showcasing its printing innovations and latest technologies at NEPCON South China 2011. The trade show will be held from 30 August to 1 September 2011 at the Shenzhen Exhibition and Convention Center. DEK's end-to-end solutions will include an extensive range of hardware, software and related services, from the award-winning print platform Horizon APiX, latest HawkEye Bridging post-print verification innovation to breakthrough ProActiv and Nano-ProTek technologies.
In addition, DEK's key highlight at NEPCON South China will focus on an enhanced customer experience. Customers will be engaged through interactive iPads, a first of its kind featured at the industry event. Delegates and attendees can look forward to live demonstrations of DEK's leading products and offerings at DEK's booth located at Hall 1, booth 1H60.
DEK's latest HawkEye Bridging technology builds on the success of the original HawkEye system, incorporating all of the benefits of its predecessor and extends them even further with the added capability of shorts and contamination detection. Designed with operators in mind, HawkEye is a high-speed paste-on-pad verification system that delivers an instant go/no-go instruction to the operator. Now, with the added functionality of HawkEye Bridging, operators have even more control and problem prevention capability with the new shorts and contamination detection offered with this latest innovation from DEK.
Along with HawkEye Bridging, DEK will also showcase its breakthrough ProActiv technology. Setting the traditional Area Ratio rule book on its head, ProActiv extends the historic 0.60 Area Ratio to a remarkable 0.40 - all while using a single thickness stencil. For those familiar with the challenges associated with highly miniaturized devices and/or heterogeneous assemblies, the print process latitude ProActiv enables is a welcome addition to the technology toolbox. Throughout the three-day event, DEK will host regular live demonstrations of its leading products and solutions including HawkEye Bridging and ProActiv.
As good prints are dependent upon good stencils, DEK has also developed a highly-effective stencil nano coating to improve the performance of new and existing stencils. Simple, low cost and remarkably effective, DEK's Nano-ProTek is a unique, proprietary coating formula that renders the entire stencil surface fluxophobic. By preventing flux from wetting the stencil surface, while pulling with it metal particles across the web of the stencil, Nano-ProTek simply and cost-effectively increases stencil cleaning effectiveness and reduces cleaning frequency. Application is straightforward and is achieved with a simple two-part wipe process. From a specially-designated stencil technology area within the booth, DEK technologists will demonstrate the ease-of-use and effectiveness of Nano-ProTek.
In addition to all of these latest breakthroughs, DEK's display will include its award-winning Horizon APiX print platform, its high performance understencil fabrics and chemistries, market-leading VectorGuard stencil technologies and unmatched customer support tools - all delivering on DEK's 'Expect More' philosophy.
DEK is a global provider of advanced materials deposition technologies and support solutions including printing equipment platforms, stencils, precision screens and mass imaging processes used across a wide range of applications in electronics pre-placement subassembly, semiconductor wafer manufacture, and alternative energy component production. For more information, visit DEK at www.dek.com.
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