Brewer Science, the inventor of ARC® anti-reflective coatings that have enabled the progress of advanced lithography, continues to deliver diverse technology solutions for FEOL and BEOL device fabrication which will be presented at the China Semiconductor Technology International Conference (CSTIC) and at SEMICON China, 19-21 March 2013, in Shanghai, China.
Brewer Science will share advancements in lithography solutions for semiconductor device manufacturing, ZoneBOND® technology, and other thin wafer handling technologies critical for 3-D IC implementation, including Brewer Science® Cee® low-volume wafer processing equipment.
Dr. Zhimin Zhu, Senior Scientist at Brewer Science, will present "Robust Trilayer Patterning Technique" at CSTIC on Monday, 18 March. Dr. Zhu will share results of Brewer Science's recent research and development work to achieve a wide critical dimension processing window (CD PW) for lithography using a spin-on trilayer patterning stack. The technique can be used to produce lines and contact patterns in a single lithographic process.
"One of the near-term challenges facing the semiconductor industry is cost-effective manufacturing and the capability to increase the photolithography critical dimension processing window," said Dr. Zhu. "Our research at Brewer Science addresses this challenge, as a larger CD PW reduces rework and increases yield."
To learn more about this method, please attend Dr. Zhimin Zhu's oral presentation Monday, 18 March, at 16:40 China Standard Time, or email email@example.com.
Visit Booth 3248 at SEMICON China, to learn more about Brewer Science’s advanced technologies that can help solve your processing needs.
About Brewer Science
Brewer Science is a global technology leader in developing and manufacturing advanced materials, processes, and equipment for the reliable fabrication of cutting-edge microdevices used in electronics such as tablet computers, smartphones, digital cameras, televisions, and LED lighting. Brewer Science provides process flexibility and a competitive edge for its customers and plays a critical role in the supply chain. Since 1981, when its ARC® materials revolutionized lithography processes, Brewer Science has expanded its technology to include products used in advanced lithography, chemical and mechanical device protection, thin layer handling, and 3-D integration and products based on carbon nanotubes and nanotechnology. With its headquarters in Rolla, Missouri, Brewer Science supports its worldwide customers through a service and distribution network in North America, Europe, and Asia.
Learn more about Brewer Science at www.brewerscience.com, follow us on Twitter @BrewerScience, or Like us on Facebook.
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