Press Release Summary:
Providing broad photoresist compatibility and tuned optical properties, ARCÂ®29L ArF Immersion BARC is suited for use in dual layer BARC stack or as single layer BARC on SiON. Coating provides low reflectivities of less than 0.1% for film thicknesses of less than 40 nm. Product extends leading-edge immersion processes in both single- and double-patterning lithography schemes.
Original Press Release:
Brewer Science Unveils the ARC®29L Series Immersion BARC
Brewer Science, the leading supplier of advanced lithography materials, is pleased
to launch ARC®29L coating, a state-of-the-art ArF immersion bottom anti-reflective coating (BARC) that provides broad photoresist compatibility and tuned optical properties for use as a top layer in a duallayer BARC stack or as a single layer BARC on SiON.
The ARC®29L unique coating is designed with the widely recognized and proven platform of the Brewer Science® ARC®29SR coating. This advanced new material provides low reflectivities, of less than 0.1% for film thicknesses of less than 40nm. This product is ideal for extending leading-edge immersion processes in both single- and double-patterning lithography schemes.
"ARC®29L coating exceeds the demands for an immersion BARC" says Chris Cox, 193-nm Product Manager for Brewer Science. "As our customers push resolution limits with ArF immersion lithography, minimizing substrate reflectivity becomes more important than ever. The lower k value of ARC®29L coating delivers a novel option for improved reflectivity control on absorbing substrates such as SiON, TiN, SiN, or dual-layer BARCs. Being able to significantly enhance a tried and true BARC platform like
the ARC®29SR coating is a tremendous benefit to our customers."
Brewer Science continuously improves leading-edge lithography products to reduce defectivity and outgassing and increase ease of line integration. For more information about the ARC®29L coatings please contact Chris Cox.
About Brewer Science
Brewer Science delivers innovative material, process, and equipment solutions for various applications including nanotechnology, lithography, advanced packaging, MEMS, optoelectronics, and compound semiconductors. As the inventor of ARC® anti-reflective coating products for the microlithography world, Brewer Science continues to expand its scope with CNTRENE® microelectronics-grade carbon nanotube solutions, ProTEK® temporary etch protective coatings, WaferBOND® temporary bonding materials, OptiNDEX(TM) high refractive index coatings, and Cee® processing equipment. Please visit
www.brewerscience.com for further information.
Product Manager, Brewer Science, Inc.
tel: +1 573-364-0300