Press Release Summary:
DimensionÂ® Edge(TM) AFM System provides seamless path from sample placement through optical identification of target region, and from AFM survey mode to zoomed-in feature identification. Closed-loop and drift-compensated stage promotes productivity and accuracy, and low noise levels permit collection of fine details needed for proper material identification. Imaging and single-point spectroscopy capabilities suit many applications, such as characterization of solar and semiconductor devices.
Original Press Release:
Veeco Introduces Dimension Edge Atomic Force Microscope System
Streamlined Access to Top AFM Performance
Santa Barbara, CA - Veeco Instruments Inc. (Nasdaq: VECO), the leading provider of atomic force microscopy technology to the nanoscience community, announced today the Dimension® Edge(TM) Atomic Force Microscope (AFM) System for physical and life sciences investigation. This latest offering follows five major AFM releases from Veeco in 2009 alone, and offers the best-in-class performance of the Dimension Icon® in a simplified package with a compact footprint. Nanoscale researchers now can utilize the top levels of AFM capability at lower system costs and with streamlined operation.
"We continue to develop and release revolutionary new AFM products, modes and system improvements aimed at enabling our customers to push scientific boundaries and set new standards in their work," said David Rossi, Vice President and General Manager of Veeco's AFM Business. "We also want to break down the cost and productivity barriers facing today's researchers. With the Dimension Edge, Veeco again shows its dedication to making nanoscale materials and device characterization accessible to every facility and user."
About Dimension Edge
The mid-priced Dimension Edge AFM features hardware and software advances that reduce the time required to produce expert-level data, providing a seamless path from sample placement through optical identification of the region of interest, and from AFM survey mode to zoomed-in feature identification. The system's proprietary closed-loop and drift-compensated stage allow the productivity, accuracy, and sample versatility advantages of a large-sample, closed-loop system to be combined with the acquisition of high-resolution images traditionally only achieved by small-sample, open-loop systems. With lower noise levels, the Dimension Edge AFM system permits collection of the finer details critical to proper material identification, while protecting fragile tips and samples, and diminishing tip artifacts.
This core performance, along with a wide offering of AFM modes, give the Dimension Edge the exceptionally accurate imaging and single-point spectroscopy capabilities required for many applications, including the characterization of solar and semiconductor devices, the mapping of heterogeneous polymer-based materials, interrogation of individual nanoparticles, and in situ imaging of life science samples from single molecules to whole cells.
Veeco Instruments Inc. manufactures enabling solutions for customers in the HB-LED, solar, data storage, semiconductor, scientific research and industrial markets. We have leading technology positions in our three businesses: LED & Solar Process Equipment, Data Storage Process Equipment, and Metrology Instruments. Veeco's manufacturing and engineering facilities are located in New York, New Jersey, California, Colorado, Arizona, Minnesota and Massachusetts. Global sales and service offices are located throughout the U.S., Europe, Japan and APAC. For more information, visit veeco.com.