Altatech Semiconductor Receives CVD Equipment Order from Fraunhofer Research Center in Munich
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AltaCVD 200 System Selected for its Ability to Perform Several Deposition Processes on a Variety of Substrates
MONTBONNOT, France, Feb. 8, 2011 - Altatech Semiconductor S.A. has received an order for its versatile AltaCVD platform from the Fraunhofer Research Institution for Modular Solid State Technology EMFT in Munich, Germany. The 200-mm AltaCVDsystem was selected for its ability to perform both plasma-enhanced and sub-atmospheric-pressure CVD processes, which the Fraunhofer center will use in depositing dielectric layers andlayer stacks on silicon and silicon-on-insulator (SOI) wafers.
The AltaCVD platform's flexible architecture allows it to be used for sub-atmospheric-pressure deposition (SACVD) of ultrathin conformal isolation layers inside deep vias and trenches with aspect ratios as high as 40:1. When used in plasma-enhanced deposition (PECVD) mode, the system can create doped silicon-oxide films used in planarizing advanced CMOS structures. All process steps run at low temperatures between 150 degrees C and 430 degrees C to reduce thermal stresses and improve yields.
The AltaCVD 200 tool will be installed at Fraunhofer EMFT by the second quarter of 2011, with continuing applications support provided by Altatech Semiconductor's local technical team, based in Dresden.
"Our highly flexible AltaCVD platform continues to generate orders from R&D leaders and chipmakers around the world. We are pleased with the acceptance of the reactor for high-k oxide and metal deposition processes and low-temperature TSV films," said Jean-Luc Delcarri, president of Altatech Semiconductor.
About Fraunhofer EMFT
The Fraunhofer Research Institution for Modular Solid State Technology EMFT in Munich develops technologies to optimize reliable microsystem components. The aim is to quickly and efficiently turn R&D results into applied processes and services, and to make these usable by industry. With its infrastructure and decades of experience, Fraunhofer EMFT is developing forward-looking solutions that have earned numerous international prizes and honors. Strategic partnerships and long-term cooperation with industry and universities around the world underscore the scientific excellence of the institute, which employs approximately 80 scientists, engineers and technicians working on technology and process development, R&D projects, feasibility studies and consulting. Fraunhofer EMFT emerged as an independent research institution from the Munich branch of the Fraunhofer Institute for Reliability and Microintegration IZM on July 1, 2010.
About Altatech Semiconductor S.A.
Incorporated in 2004, Altatech Semiconductor manufactures wafer inspection and analysis, liquid-vaporization CVD, and nanoprinting equipment at its headquarters facility near Grenoble, France's epicenter of microelectronics production. Led by a management team with more than 30 years of experience in the semiconductor equipment industry, the company is focused on helping customers to achieve the fastest design-to-market cycle times for products serving the emerging semiconductor, MEMS and nanotechnology markets. For more information, visit www.altatech-sc.com.
SOURCE Altatech Semiconductor S.A.
CONTACT:
Jean-Luc Delcarri,
President of Altatech Semiconductor S.A.,
33 4 56 526 800,
jeanluc.delcarri@altatech-sc.com,
or in the U.S., Bruce Hokanson,
+1-360-258-1260,
brucehokanson@comcast.net
Web Site: www.altatech-sc.com
