Advanced Energy® to Feature Aera® Pi-980(TM) Series Pressure-Insensitive MFC for Advanced Processes at SEMICON China 2006

AE also showcasing Navigator(TM) Digital Matching Network

SHANGHAI, China, March 14, 2006-Advanced Energy Industries, Inc. (Nasdaq: AEIS) today announced that it will feature its Aera® PI-980(TM) series pressure-insensitive mass flow controller (MFC) during SEMICON China 2006. The company also will showcase its Navigator(TM) Digital Matching Network and the Litmas(TM) RPS 1501 and 3001 remote plasma source platform at the exposition, held March 21-23 at the Shanghai New International Expo Center (SNIEC) in Shanghai, China.

The Aera PI-980 series pressure-insensitive MFC is especially well-suited for etch, CVD, PVD, and diffusion applications, delivering faster response, greater gas-flow stability, higher accuracy, and better real-time process control than previous technologies or competitive products. Specifically, its superior gas-flow stability provides greater chamber-to-chamber process repeatability for improved production yields. The advanced design of the PI-980 integrates traditional thermal flow architecture with a pressure sensor, pressure display, temperature sensor and NeuralStep(TM) control technology, creating a single delivery package and eliminating the need for the costly gas-panel components traditionally used to perform the same function.

In addition, the Navigator Digital Matching Network will be exhibited at AE's booth #2326. The Navigator, which is equipped with microprocessor-controlled stepper motor circuitry and digital, user-selectable tuning algorithms, minimizes reflected power by automatically tuning the complex impedance of a coupled plasma. For real-time measurement and analysis of process power and impendence, the optional, internal Z'Scan® RF sensor enables the user to identify and significantly reduce process variability.

Also showcased this year will be AE's Litmas RPS 1.5 kW and 3 kW integrated plasma source and power-delivery systems. The Litmas RPS is the only fully integrated, remote, inductive plasma source and power delivery system available in a high-conductance, low-surface-area geometry. It is well-suited to deliver reactive gas specie fluxes for process applications such as wafer pre-clean, photoresist strip and thin-film deposition.

To learn more about AE's products during SEMICON China, March 21-23, visit their booth #2326 in hall W2 at the Shanghai New International Expo Center (SNIEC) in Shanghai, China.

About Advanced Energy
Advanced Energy is a global leader in the development and support of technologies critical to high-technology manufacturing processes used in the production of semiconductors, flat panel displays, data storage products, compact discs, digital video discs, architectural glass and other advanced product applications.

Leveraging a diverse product portfolio and technology leadership, AE creates solutions that maximize process impact, improve productivity and lower cost of ownership for its customers. This portfolio includes a comprehensive line of technology solutions in power, flow management, thermal instrumentation and plasma and ion beam sources for original equipment manufacturers (OEMs) and end-users around the world.

AE operates in regional centers in North America, Asia and Europe and offers global sales and support through direct offices, representatives and distributors. Founded in 1981, AE is a publicly held company traded on Nasdaq National Market under the symbol AEIS. More information can be found at

Marna Shillman
Corporate Communication Manager
Advanced Energy Industries, Inc.

Angie Kellen
Account Director

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