Association News

OSA Announces 163 Individuals as new Senior Members.

Press Release Summary:

Jun 10, 2016 - Recognizing well-established individuals for their experience and professional accomplishments within optics/photonics field, The Optical Society (OSA) Board of Directors named 163 new Senior Members at CLEO:2016. Senior Membership requires individuals to have at least 10 years significant professional experience in field, active OSA Membership, and 2 endorsement statements from current OSA Members. OSA president Alan Willner congratulated qualifying members for their contributions.

The Optical Society (OSA) - Washington, DC

Original Press Release

The Optical Society Announces 2016 Class of Senior Members

Press release date: Jun 08, 2016

WASHINGTON — The Optical Society (OSA) Board of Directors is pleased to announce the approval of 163 new Senior Members — an OSA distinction that provides well-established individuals recognition for their experience and professional accomplishments within the field of optics and photonics. The 163 Senior Members were announced today at CLEO:2016. A listing of the newly inducted OSA Senior Members appears below.

“The Optical Society welcomes this year’s Senior Class who join a distinguished group of scientists, engineers and business leaders who have demonstrated exemplary professional accomplishments in optics and photonics,” said Alan Willner, president of The Optical Society and OSA Fellow. “Our congratulations go out to these members for their contributions to our global community.”

To qualify for Senior Membership, individuals must have at least ten years of significant professional experience in the field, an active OSA Membership and two endorsement statements from current OSA Members. Requests are reviewed by OSA’s Member and Education Services Council, which then recommends candidates to the Board of Directors for approval.

Senior Members receive the full complement of OSA Member benefits and services, plus:
• Special Recognitions – Senior Members are identified in the OSA Member Directory, on and during OSA-hosted events.
• Announcements – In addition to this news release, newly-approved Senior Members are announced in:   Optics & Photonics News and the OSA Member e-newsletter.
• Senior Member Certificate and Lapel Pin – Recognition materials are distributed upon request approval.
• Letter of Recognition – Approved Senior Members may request that a confirmation letter be sent to their employer.

Following is an alphabetical listing of the 163 Senior Members announced at CLEO:2016:

Vladimir Aksyuk, National Inst of Standards & Technology, USA
Amin Al-Khursan, Thi-Qar University, Iraq
Percival Almoro, University of the Philippines-Diliman, Philippines
Farzin Amzajerdian, NASA Langley Research Center, USA
Andrea  Armani, University of Southern California, USA      
Imrana  Ashraf, Quaid-I-Azam University, Pakistan
Clara Rivero Baleine, Lockheed Martin Corp., USA  
Christoph Becher, Universität des Saarlandes, Germany
Andreas Beling, University of Virginia, USA
Yves Bellouard, Ecole Polytechnique Federale de Lausanne, Switzerland
Aniceto Belmonte, Univ Politec de Catalunya Barcelona Tech, Spain
Corey Bennett, Lawrence Livermore National Laboratory, USA
Garry Berkovic, Soreq Nuclear Research Center, Israel
Nicolò Beverini, Università degli Studi di Pisa, Italy
Frank Beyrau, Universität Magdeburg, Germany
Shanti Bhattacharya, IIT Madras, India
Joerg Bischoff, Osires, Germany
Umberto Bortolozzo, Universite de Nice Sophia Antipolis, France
Alan Bristow, West Virginia University, USA
Jake Bromage, University of Rochester, USA
Douglas Brown, Raytheon ELCAN Optical Technologies, Canada
Kristian Buchwald, Ibsen Photonics A/S, Denmark
Liangcai Cao, Tsinghua University, China
Román Castañeda, Universidad Nacional de Colombia, Colombia
Shu-Wei Chang, Research Center for Applied Sciences, Taiwan
Hongwei Chen, Tsinghua University, China
YuBin Chen, National Cheng Kung University, Taiwan
Daoxin Dai, Zhejiang University, China
Prasanta  Datta, Indian Institute of Technology Kharagpur, India    
Alberto Diaspro, Istituto Italiano di Tecnologia, Italy      
Ivan Divliansky, University of Central Florida, CREOL, USA
Leonid Dombrovsky, Russian Academy of Sciences, Russia
Peter Dragic, Univ of Illinois at Urbana-Champaign, USA
Allen Earman, AOSense, Inc., USA
Georgios Ellinas, University of Cyprus, Cyprus
Habib Fathallah, King Saud University, Saudi Arabia
Mário Ferreira, Universidade de Aveiro, Portugal
J. Michael Finlan, Northrop Grumman Corp., USA             
Andreas Fix, Institut fuer Physik der Atmosphaere, Germany
Keith Forsyth, USA       
Shayan Garani, Indian Institute of Science, Bangalore, India      
Yuriy Garbovskiy, University of Colorado, Colorado Springs, USA
Jorge Garcia-Sucerquia, Universidad Nacional de Colombia, Colombia
John Gillaspy, National Science Foundation, USA
Keisuke Goda, University of Tokyo, Japan
Lifu Gong, Oplink Communications Inc., USA
Juliet Gopinath, Colorado Photonics Industry Association, USA
Mircea Guina, Tampereen Teknillinen Yliopisto, Finland
Brahim Guizal, Laboratoire Charles Coulomb, France          
Huanqing Guo, Detection and Vision System, Ireland
Khaled Habib, Materials Science & Photo-Electronics Lab, Kuwait
Peter Hartmann, SCHOTT AG, Germany
John Heebner, Lawrence Livermore National Laboratory, USA
Matthias Hoffmann, SLAC National Accelerator Laboratory, USA
Esa Jaatinen, Queensland University of Technology, Australia
Matthias Jaeger, Institute of Photonic Technology, Germany
Vijay Janyani, Malaviya National Institute of Tech., India
Richard Jensen, Polatis, Inc., USA
Jianming Jin, Univ of Illinois at Urbana-Champaign, USA
Kyriacos Kalli, Cyprus University of Technology, Cyprus
Søren Keiding, Aarhus University, Denmark
Tina Kidger, Kidger Optics Associates, United Kingdom
Johannes Kiefer, Universitat Bremen, Germany
Alexander Kildishev, Purdue University, USA
Jaeyoun Kim, Iowa State University, USA
Sergey Kobtsev, Novosibirsk State University, Russia
Peter Krug, Australia
Anna Kudryavtseva, P.N. Lebedev Physical Institute, Russia
Sunao Kurimura, National Institute for Materials Science, Japan
Chee-Wei Lee, Data Storage Institute, Singapore
Jason Lee, Rofin Sinar UK, United Kingdom
John Lee, US Naval Research Laboratory, USA
Sergio Leon-Saval, University of Sydney, Australia
Renat Letfullin, Rose-Hulman Institute of Technology, USA
Changsheng Li, Beihang University, China  
Jianzhao Li, University of Toronto, Canada
Yanqiu Li, Beijing Institute of Technology, China
Chien-chung Lin, National Chiao Tung University, Taiwan
Kurt Linden, N2 Biomedical, USA
Dahe Liu, Beijing Normal University, China
Jonathan Liu, University of Washington, USA
Quan Liu, Nanyang Technological University, Singapore
Zhengiun Liu, Harbin Institute of Technology, China
Ter-Hoe Loh, Broadcom Limited, Singapore
Marco Lombardo, IRCCS Fondazione G.B. Bietti, Italy
Arkady Major, University of Manitoba, Canada
Alejandro Martinez, Universitat Politècnica de València, Spain
Madhavi  Martin, Oak Ridge National Laboratory, USA       
Dalip Mehta, Indian Institute of Technology, Delhi, India
Gabriel Mennerat, Lawrence Livermore National Laboratory, USA   
Vinod Menon, City College of New York, USA
Christopher Middlebrook, Michigan Technological University, USA
Maria Millan, Universitat Politecnica de Catalunya, Spain
Jean-Pierre Monchalin, National Research Council Canada, Canada
Germano Montemezzani, Universite de Lorraine, France
Linda Mullen, Naval Air Systems Command, USA
Niru Nahar, Ohio State University, USA
Chittur Narayanamurthy, Indian Institute of Space Sci & Tech, India
Miguel Navarro-Cia, University of Birmingham, USA
George Nehmetallah, Catholic University of America, USA         
Galina Nemova, Polytechnique Montreal, Canada
Kristian Nielsen, Danish Meteorological Institute, Denmark
Takahiro, Ode  FOV, Japan
Kimio Oguchi, Seikei University, Japan
Hirotaka Ono, NTT Device Technology Laboratories, Japan
Wounjhang (Won) Park, University of Colorado at Boulder, USA
Helen Pask, Macquarie University, Australia
Guido Perrone, Politecnico di Torino, Italy
Nicholas Peters, Oak Ridge National Laboratory, USA
Michael Pircher, Medical University of Vienna, Austria
Pablo Postigo, Consejo Sup Investigaciones Cientificas, Spain
Kemao Qian, Nanyang Technological University, Singapore
Yury Rakovich, Center for Mat Physics, CSIC-UPV/EHU, Spain
S. Anantha Ramakrishna, Indian Institute of Technology, Kanpur, India
Danny Rich, Sun Chemical Corporation, USA
Andre Richter, VPIphotonics, Germany
Clara Rivero Baleine, Lockheed Martin Corp., USA  
Martin Rochette, McGill University, Canada
Eric Rosas-Solis, Centro de Investigaciones en Óptica, Mexico   
Ali Rostami, University of Tabriz, Iran
Filippus Roux, CSIR National Laser Centre, South Africa
Brian Salzberg, University of Pennsylvania, USA
Darryl Sanchez, US Air Force Research Laboratory, USA
David Scherer, Microsemi, USA
Katharine Schmidtke, Facebook, USA
Axel Schulzgen, University of Central Florida, USA
Thomas Seeger, Universität Siegen, Germany         
Zouheir Sekkat, MAScIR, Morocco
Sergey Sergeyev, Aston University, United Kingdom
Omur Sezerman, OZ Optics Ltd, Canada
Xiaoming Shang, Candela Corp., USA
David Shapiro, Institute of Automation and Electrometry, Russia
Shyh-Chiang Shen, Georgia Institute of Technology, USA
Min-Hsiung Shih, RCAS, Academia Sinica, Taiwan
Mehrdad Shokooh-Saremi, Ferdowsi University of Mashhad, Iran
L. Montgomery Smith, University of Tennessee Space Institute, USA
Marat Soskin, National Academy of Sciences of Ukraine, Ukraine
Steven Spector, Charles Stark Draper Laboratory, USA
Balaji Srinivasan, Indian Institute of Technology, Madras, India
Paul Steinvurzel, The Aerospace Corporation, USA
James Stewart, Inphi Corporation, USA
Slawomir Sujecki, University of Nottingham, United Kingdom
Sergey Sukhov, University of Central Florida, CREOL, USA
Robert Tench, Cybel, LLC., USA
Isabell Thomann, Rice University, USA
Tim Thomas, PDX Photonics, USA
Victor Torres-Company, Chalmers Tekniska Hogskola, Sweden
Roberto Torroba, Centro de Investigaciones en Optica AC, Argentina
Nikolaos Tsitsas, Aristotle University of Thessaloniki, Greece
Dmitry Turchinovich, Max Planck Inst. for Polymer Research, Germany
Selim Unlu, Boston University, USA
Georgios Veronis, Louisiana State University, USA
Matias Viotti, Universidade Federal de Santa Catarina, Brazil
Jian Wang, Huazhong University of Science and Technology, China
Pei-Kuen Wei, Academia Sinica, Taiwan
Christian Wetzel, Rensselaer Polytechnic Institute, USA
Fred Whitney, Lockheed Martin Corp., USA
Guanglin Yang, Peking University, China
Baoli Yao, Chinese Academy of Sciences, China
Ya Sha Yi, University of Michigan, USA
Zhen  Yuan, University of Macau, Macau
Patrick Yue, HKUST, Hong Kong
Hans Zappe, University of Freiburg, Germany
Song Zhang, Purdue University, USA

About The Optical Society
Founded in 1916, The Optical Society (OSA) is the leading professional organization for scientists, engineers, students and entrepreneurs who fuel discoveries, shape real-life applications and accelerate achievements in the science of light. Through world-renowned publications, meetings and membership initiatives, OSA provides quality research, inspired interactions and dedicated resources for its extensive global network of optics and photonics experts. For more information, visit:

About CLEO
With a distinguished history as the industry's leading event on laser science, the Conference on Lasers and Electro-Optics (CLEO) is the premier international forum for scientific and technical optics, uniting the fields of lasers and opto-electronics by bringing together all aspects of laser technology, from basic research to industry applications. CLEO: Expo showcases the latest products and applications from more than 300 participating companies from around the world, providing hands-on demonstrations of the latest market innovations and applications. The Expo also offers valuable on-floor programming, including Market Focus and the Technology Transfer program.

Managed by The Optical Society (OSA) and sponsored by the American Physical Society's (APS) Laser Science Division, IEEE Photonics Society and OSA, CLEO provides the full range of critical developments in the field, showcasing the most significant milestones from laboratory to marketplace. With an unparalleled breadth and depth of coverage, CLEO connects all of the critical vertical markets in lasers and electro-optics. For more information, visit the event website at Follow developments and updates on CLEO 2016 on Twitter @CLEOConf, #CLEO16.

Media Registration:  A media room for credentialed press and analysts will be located on-site in the San Jose Convention Center, 5-10 June 2016. Media interested in attending the event should register on the CLEO website media center: Media Center.

Media Contact:
The Optical Society