NIST Fabrication Facility adds electron beam lithography system.

Press Release Summary:



NanoFab (nanoscale fabrication facility) at NIST is expanding its capabilities to serve those specializing in development of nanotechnology-related products and processes. Managed by NIST's Center for Nanoscale Science and Technology (CNST), national user facility is adding second high-voltage, large-field electron-beam lithography system into operation in April. Recently, center added Heidelberg DWL-66FS laser pattern generator, Oxford FlexALRPT, and 2 ICP reactive ion etch systems.



Original Press Release:



NanoFab Adds New Capabilities



The NanoFab (nanoscale fabrication facility) at the National Institute of Standards and Technology (NIST) is expanding its capabilities to serve researchers, academic institutions and businesses that specialize in developing and bringing to market nanotechnology-related products and processes. Managed by NIST's Center for Nanoscale Science and Technology (CNST), the national user facility is placing a second high-voltage large-field electron-beam lithography system into operation in April, and also has added several other new state-of-the-art instruments for fabricating nanoscale devices and making measurements. The center recently added a Heidelberg DWL-66FS laser pattern generator for maskless lithography, an Oxford FlexALRPT for atomic layer deposition, and two new ICP reactive ion etch systems.

The CNST's mission is to increase U.S. innovation and competitiveness in nanoscale measurement and fabrication. Its NanoFab now houses more than 50 specialized instruments that are available for use by outside organizations. For more information on the NanoFab, call (301) 975-4529 or visit the NanoFab Web pages at http://cnst.nist.gov/nanofab/nanofab.html.

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