NIST Cosponsors Conference focused on nanoelectronics metrology.
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Press Release Summary:
Registration is open for Frontiers of Characterization and Metrology for Nanoelectronics, which will take place May 23-26, 2011 in Grenoble, France. Industry, government, and academic experts will examine advances in characterization and metrology that will help shape future of nanoelectronics. Presenters include Michel Brillouet, Deputy Director of CEA-Leti; Rudi Cartuyvels of IMEC, and Dan Hutcheson of VSLI Research, Inc. Attendees can also tour MINATEC research campus.
Original Press Release:
NIST to Cosponsor Conference in France on Nanoelectronics Metrology
Registration is now open for the eighth international Frontiers of Characterization and Metrology for Nanoelectronics conference, cosponsored by the National Institute of Standards and Technology (NIST), which will take place May 23-26, 2011, at the MINATEC campus in Grenoble, France. Experts from industry, government and academia will examine the latest advances in characterization and metrology that will help shape the future of nanoelectronics.
The first conference in the series to be held outside the United States, it will feature presentations from experts such as Michel Brillouet, Deputy Director of CEA-Leti (the Electronics and Information Technologies Laboratory of the French atomic energy commission); Rudi Cartuyvels, General Manager of IMEC; and Dan Hutcheson, CEO of VSLI Research, Inc. The conference also will offer the opportunity to tour MINATEC, a research campus founded in 2006 as a partnership between CEA-Leti and the Grenoble Institute of Technology (INPG) with the goal of becoming a leading center for excellence in micro- and nanotechnology. The full conference program is available at nist.gov/pml/semiconductor/conference/2011program.cfm#invited.
The registration deadline is May 1, 2011. Visit fcmn2011.insight-outside.fr/ to register online.
