Ulvac Technologies, Inc.
Methuen, MA 01844
Quadrupole Mass Spectrometer provides residual gas analysis.
Useful for leak detection and system monitoring, Qulee features removable front-end electronics package that permits replacement of quadrupole analyzer. Integrated control display on electronics box eliminates need for PC to operate unit, and provides one-touch partial pressure readout of He, H2O, N2, O2, O2/N2 ratio. Featuring built-in setpoints with serial I/O remote control, unit has max...
Read More »Microscope includes integrated heating system.
Integrating compound microscope with infrared gold image furnace hot stage and video recording and display system, Model MS-E1S enables direct observation of melting and recrystallization behavior of materials. Samples can be maintained in any gas environment and pressure or vacuum level, and can be heated up to 1,000Ã-
Read More »Programmable Furnace heats to 1,200-
Suited for high-temperature materials testing and analysis, tabletop MILA-3000 heats samples using IR gold image furnace with programmable digital temperature controller; clean, atmosphere-controlled, quartz glass vacuum chamber; and gas controller. Mini-Lamp Annealing system can be used for various heating and cooling experiments, with its controlled heating rates of 50Ã-
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Leak Detectors come with color touchscreen display.
Series Heliot 700 helium leak detectors have multiple valve design that provides sensitivity of 10-12 Torr. Features include start-up auto-calibration, optional external leak calibration, and CE mark/IP30. Four models are available: small and large rotary vane, dry diaphragm, and dry scroll pump. Troubleshooting is accomplished with integrated maintenance software.
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Vacuum Pump works at variable pumping speeds.
Inverter equipped DYM series high speed dry vacuum pump provides pumping speeds from 330 to 1,200 m3/hr. It combines company's DR-C series dry pump and PRC-A series mechanical booster pump. Pumps are close coupled inside enclosed frame for CVD and etch applications, and unit is coated with TUFRAM(TM) for resistance to corrosive chemicals and wear. It has control system, RS232C interface, and...
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Vacuum Gauge can be baked to 300 deg C.
Vacuum gauge offers Bessel-Box type energy filter and axially symmetric transmission (AxTRAN) gauge head. Its measurable pressure range is 7.5 x 10E-4 torr to 3.5 x 10E-13 torr. AxTRAN is resistant to interfering noise effects caused by light, radiation, and electrostatic discharge ions. Control unit is world-voltage compatible (85V - 240VAC 50/60Hz), and offers bright LED display and 0-10V...
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Sputter Ion Pumps have no moving parts.
Vibration-free ACTER series sputter ion pumps for ultra high and extremely high vacuum (UHV and XHV) applications consist of optimized magnetic field and internal pumping arrays (ACTER cells). Pumps offer minimal magnetic flux density leakage and rapid recovery from brief power interruptions. They have no moving parts, and can attain ultimate pressure of 10E-10 Pa. Suitable applications include...
Read More »
Gas Analyzer checks residual gas in vacuum systems.
PC-controlled REGA quadrupole mass spectrometer measures residual gas in PVD systems and high vacuum pumping equipment, performs gas analysis for PVC processes and thermal desorption spectroscope studies, and functions as in-situ system helium leak detector. Its analyzer head reads total pressure, eliminating need for separate hot cathode ionization vacuum gauge. Control unit operates on 24VDC,...
Read More »
Gas Process Monitor is suitable for CVD applications.
Compact, corrosion-resistant REPROS monitors and controls etch or deposition processes, measures residual gases, and can be used for leak detection. It monitors reactive gases at pressures up to 9.75 torr. Unit has conductance valve with 3 gas inlet modes, differentially pumped mass filter system, and closed ion source with magnetic field enhancement of ionization chamber. Monitor operates on 24...
Read More »Vacuum Pump suits semiconductor CVD and etch applications.
DRYMAC PDR-C series with multi-stage Roots pump design is available in 47, 74, and 139 cfm ratings, with integrated booster pumps for 200, 400 or 600 cfm. Lightweight aluminum casing and rotor create uniform operating temperatures throughout six Roots stages. Uniform temperatures help prevent condensable process gas byproducts from adhering to internal pump surfaces. Unit is coated in Tufram for...
Read More »Quadrupole Mass Spectrometer provides residual gas analysis.
Useful for leak detection and system monitoring, Qulee features removable front-end electronics package that permits replacement of quadrupole analyzer. Integrated control display on electronics box eliminates need for PC to operate unit, and provides one-touch partial pressure readout of He, H2O, N2, O2, O2/N2 ratio. Featuring built-in setpoints with serial I/O remote control, unit has max...
Read More »Microscope includes integrated heating system.
Integrating compound microscope with infrared gold image furnace hot stage and video recording and display system, Model MS-E1S enables direct observation of melting and recrystallization behavior of materials. Samples can be maintained in any gas environment and pressure or vacuum level, and can be heated up to 1,000Ã-
Read More »Programmable Furnace heats to 1,200-
Suited for high-temperature materials testing and analysis, tabletop MILA-3000 heats samples using IR gold image furnace with programmable digital temperature controller; clean, atmosphere-controlled, quartz glass vacuum chamber; and gas controller. Mini-Lamp Annealing system can be used for various heating and cooling experiments, with its controlled heating rates of 50Ã-
Read More »
Leak Detectors come with color touchscreen display.
Series Heliot 700 helium leak detectors have multiple valve design that provides sensitivity of 10-12 Torr. Features include start-up auto-calibration, optional external leak calibration, and CE mark/IP30. Four models are available: small and large rotary vane, dry diaphragm, and dry scroll pump. Troubleshooting is accomplished with integrated maintenance software.
Read More »
Vacuum Pump works at variable pumping speeds.
Inverter equipped DYM series high speed dry vacuum pump provides pumping speeds from 330 to 1,200 m3/hr. It combines company's DR-C series dry pump and PRC-A series mechanical booster pump. Pumps are close coupled inside enclosed frame for CVD and etch applications, and unit is coated with TUFRAM(TM) for resistance to corrosive chemicals and wear. It has control system, RS232C interface, and...
Read More »
Vacuum Gauge can be baked to 300 deg C.
Vacuum gauge offers Bessel-Box type energy filter and axially symmetric transmission (AxTRAN) gauge head. Its measurable pressure range is 7.5 x 10E-4 torr to 3.5 x 10E-13 torr. AxTRAN is resistant to interfering noise effects caused by light, radiation, and electrostatic discharge ions. Control unit is world-voltage compatible (85V - 240VAC 50/60Hz), and offers bright LED display and 0-10V...
Read More »
Sputter Ion Pumps have no moving parts.
Vibration-free ACTER series sputter ion pumps for ultra high and extremely high vacuum (UHV and XHV) applications consist of optimized magnetic field and internal pumping arrays (ACTER cells). Pumps offer minimal magnetic flux density leakage and rapid recovery from brief power interruptions. They have no moving parts, and can attain ultimate pressure of 10E-10 Pa. Suitable applications include...
Read More »
Gas Analyzer checks residual gas in vacuum systems.
PC-controlled REGA quadrupole mass spectrometer measures residual gas in PVD systems and high vacuum pumping equipment, performs gas analysis for PVC processes and thermal desorption spectroscope studies, and functions as in-situ system helium leak detector. Its analyzer head reads total pressure, eliminating need for separate hot cathode ionization vacuum gauge. Control unit operates on 24VDC,...
Read More »
Gas Process Monitor is suitable for CVD applications.
Compact, corrosion-resistant REPROS monitors and controls etch or deposition processes, measures residual gases, and can be used for leak detection. It monitors reactive gases at pressures up to 9.75 torr. Unit has conductance valve with 3 gas inlet modes, differentially pumped mass filter system, and closed ion source with magnetic field enhancement of ionization chamber. Monitor operates on 24...
Read More »Vacuum Pump suits semiconductor CVD and etch applications.
DRYMAC PDR-C series with multi-stage Roots pump design is available in 47, 74, and 139 cfm ratings, with integrated booster pumps for 200, 400 or 600 cfm. Lightweight aluminum casing and rotor create uniform operating temperatures throughout six Roots stages. Uniform temperatures help prevent condensable process gas byproducts from adhering to internal pump surfaces. Unit is coated in Tufram for...
Read More »