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Ultratech Receives Follow-On Order from Major Foundry for Laser Spike Anneal System
Foundry Plans to use Ultratech's LSA101 Dual Beam System to Ramp 28-nm Production SAN JOSE, Calif. - Ultratech, Inc. (Nasdaq: UTEK), a leading supplier of lithography, laser-processing and inspection systems used to manufacture semiconductor devices and high-brightness LEDs (HB-LEDs), as well as atomic layer deposition (ALD) systems, today announced a follow-on order from a major foundry for its...
Read More »Ultratech Expands Advanced-Packaging Offerings with New Low-Cost Unity Platform(TM)-Based Tools Targeting Foundry Customers
Unity GOLD and Unity PLATINUM Deliver Low-risk, Low-cost, Production-Proven Lithography Solutions SAN JOSE, Calif., Sept. 19 /-- Ultratech, Inc. (NASDAQ:UTEK), a leading supplier of lithography and laser-processing systems used to manufacture semiconductors and nanotechnology devices, today introduced two new advanced-packaging (AP) lithography tools built on the company's highly successful Unity...
Read More »Stepper suits advanced-packaging applications.
Saturn Spectrum 300e(2) stepper, offers dual-lamp illumination option, which provides wafer-plane irradiance (>3400 mW/cmÃ-²) and throughput while exposing thick resists. Its edge processing capabilities provide edge-exposure and exclusion capability to deliver yield, imaging, and throughput performance required for flip-chip and wafer-level packaging (WLP) applications. Stepper also uses...
Read More »Stepper Family suits nanotechnology applications.
NanoTech(TM) 100 offers 1.0 or 0.8 micron lens options, Machine Vision System (MVS), and PC controller. NanoTech 160 is available with 2.0, 1.0, or 0.8 micron lens. NanoTech 190 offers 2.0 or 1.0 micron lens and application-specific, air-bearing rowbar patterning system. Designed for processing thick and thin films, NanoTech 200 features 1.4 or 1.0 micron lens options. With production resolution...
Read More »Ultratech Receives Follow-On Order from Major Foundry for Laser Spike Anneal System
Foundry Plans to use Ultratech's LSA101 Dual Beam System to Ramp 28-nm Production SAN JOSE, Calif. - Ultratech, Inc. (Nasdaq: UTEK), a leading supplier of lithography, laser-processing and inspection systems used to manufacture semiconductor devices and high-brightness LEDs (HB-LEDs), as well as atomic layer deposition (ALD) systems, today announced a follow-on order from a major foundry for its...
Read More »Ultratech Opens Advanced Manufacturing Facility in Singapore
Ultratech Celebrates Grand Opening of New Singapore International Operations SAN JOSE, Calif., Dec. 6, 2010 - Ultratech, Inc. (Nasdaq: UTEK), a leading supplier of lithography and laser-processing systems used to manufacture semiconductor devices and high-brightness LEDs (HB-LEDs), today officially opened an advanced manufacturing facility in Singapore. Ultratech plans to spend more than $125...
Read More »Ultratech Announces the Opening of Its Singapore International Operations
SAN JOSE, Calif., Nov. 17, 2010 -- Ultratech, Inc. (Nasdaq: UTEK), a leading supplier of lithography and laser-processing systems used to manufacture semiconductor devices and high-brightness LEDs (HB-LEDs), today announced the opening of its Singapore international headquarters. To better serve its large customer base in Asia, the Ultratech Singapore operations will include engineering and...
Read More »Ultratech Expands Advanced-Packaging Offerings with New Low-Cost Unity Platform(TM)-Based Tools Targeting Foundry Customers
Unity GOLD and Unity PLATINUM Deliver Low-risk, Low-cost, Production-Proven Lithography Solutions SAN JOSE, Calif., Sept. 19 /-- Ultratech, Inc. (NASDAQ:UTEK), a leading supplier of lithography and laser-processing systems used to manufacture semiconductors and nanotechnology devices, today introduced two new advanced-packaging (AP) lithography tools built on the company's highly successful Unity...
Read More »Stepper suits advanced-packaging applications.
Saturn Spectrum 300e(2) stepper, offers dual-lamp illumination option, which provides wafer-plane irradiance (>3400 mW/cmÃ-²) and throughput while exposing thick resists. Its edge processing capabilities provide edge-exposure and exclusion capability to deliver yield, imaging, and throughput performance required for flip-chip and wafer-level packaging (WLP) applications. Stepper also uses...
Read More »Stepper Family suits nanotechnology applications.
NanoTech(TM) 100 offers 1.0 or 0.8 micron lens options, Machine Vision System (MVS), and PC controller. NanoTech 160 is available with 2.0, 1.0, or 0.8 micron lens. NanoTech 190 offers 2.0 or 1.0 micron lens and application-specific, air-bearing rowbar patterning system. Designed for processing thick and thin films, NanoTech 200 features 1.4 or 1.0 micron lens options. With production resolution...
Read More »