Mattson Technology Canada, Inc.
Vancouver, BC V6P6T7 CAN
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Photoresist Strip Product adresses BEOL/FEOL applications.
Alpine(TM) system is designed to meet requirements of photoresist strip processes on back-end-of-line (BEOL) and front-end-of-line (FEOL) applications for future technology nodes. While etch chamber offers optimal profile control, inductively coupled plasma source and bias capability enables independent control of ion energy and density at low pressures to minimize damage to low-k materials for...
Read More »Photoresist Strip Product adresses BEOL/FEOL applications.
Alpine(TM) system is designed to meet requirements of photoresist strip processes on back-end-of-line (BEOL) and front-end-of-line (FEOL) applications for future technology nodes. While etch chamber offers optimal profile control, inductively coupled plasma source and bias capability enables independent control of ion energy and density at low pressures to minimize damage to low-k materials for...
Read More »Strip System can be configured with 2 dual-wafer modules.
Suited for high-volume manufacturing at 90 nm node and below, Suprema 300 mm Strip System is based on modular design that makes it suited for development and production environments. Vacuum and atmospheric robots deliver throughput greater than 300 wafers/hr, and vacuum robot is capable of transferring 4 wafers simultaneously. Inductively coupled plasma source provides strip rates over 9...
Read More »Strip System can be configured with 2 dual-wafer modules.
Suited for high-volume manufacturing at 90 nm node and below, Suprema 300 mm Strip System is based on modular design that makes it suited for development and production environments. Vacuum and atmospheric robots deliver throughput greater than 300 wafers/hr, and vacuum robot is capable of transferring 4 wafers simultaneously. Inductively coupled plasma source provides strip rates over 9...
Read More »Photoresist Strip Product adresses BEOL/FEOL applications.
Alpine(TM) system is designed to meet requirements of photoresist strip processes on back-end-of-line (BEOL) and front-end-of-line (FEOL) applications for future technology nodes. While etch chamber offers optimal profile control, inductively coupled plasma source and bias capability enables independent control of ion energy and density at low pressures to minimize damage to low-k materials for...
Read More »Photoresist Strip Product adresses BEOL/FEOL applications.
Alpine(TM) system is designed to meet requirements of photoresist strip processes on back-end-of-line (BEOL) and front-end-of-line (FEOL) applications for future technology nodes. While etch chamber offers optimal profile control, inductively coupled plasma source and bias capability enables independent control of ion energy and density at low pressures to minimize damage to low-k materials for...
Read More »Mattson Technology, Inc. to Webcast Presentation at Needham and Company, LLC 10th Annual Growth Conference
FREMONT, Calif., Dec. 20 / -- Mattson Technology, Inc. (NASDAQ:MTSN), a leading supplier of advanced process equipment used to manufacture semiconductors, announced today that David Dutton, Chief Executive Officer will provide a company overview at the Needham and Company, LLC 10th Annual Growth Stock Conference on Tuesday, January 8, 2008 at The Palace Hotel in New York. A live webcast of the...
Read More »Mattson Technology, Inc. to Webcast Presentation at Needham and Company, LLC 10th Annual Growth Conference
FREMONT, Calif., Dec. 20 / -- Mattson Technology, Inc. (NASDAQ:MTSN), a leading supplier of advanced process equipment used to manufacture semiconductors, announced today that David Dutton, Chief Executive Officer will provide a company overview at the Needham and Company, LLC 10th Annual Growth Stock Conference on Tuesday, January 8, 2008 at The Palace Hotel in New York. A live webcast of the...
Read More »Strip System can be configured with 2 dual-wafer modules.
Suited for high-volume manufacturing at 90 nm node and below, Suprema 300 mm Strip System is based on modular design that makes it suited for development and production environments. Vacuum and atmospheric robots deliver throughput greater than 300 wafers/hr, and vacuum robot is capable of transferring 4 wafers simultaneously. Inductively coupled plasma source provides strip rates over 9...
Read More »Strip System can be configured with 2 dual-wafer modules.
Suited for high-volume manufacturing at 90 nm node and below, Suprema 300 mm Strip System is based on modular design that makes it suited for development and production environments. Vacuum and atmospheric robots deliver throughput greater than 300 wafers/hr, and vacuum robot is capable of transferring 4 wafers simultaneously. Inductively coupled plasma source provides strip rates over 9...
Read More »