Molecular Imprints, Inc.

Optics & Photonics

Molecular Imprints J-FIL Technology Has Now Demonstrated the Ability to Produce High Performance Wire Grid Polarizers for Use in Flat Panel Displays

- Large area wire grid polarizers with feature sizes of 50nm and below will increase the resolution, reduce the power consumption and lower the cost of a flat panel display AUSTIN, Texas – Molecular Imprints Inc. (MII), the market and technology leader for nanopatterning systems and solutions, today announced it has developed a roll-based Jet and Flash-® Imprint Lithography (J-FIL®)...

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Optics & Photonics

Molecular Imprints J-FIL Technology Has Now Demonstrated the Ability to Produce High Performance Wire Grid Polarizers for Use in Flat Panel Displays

- Large area wire grid polarizers with feature sizes of 50nm and below will increase the resolution, reduce the power consumption and lower the cost of a flat panel display AUSTIN, Texas – Molecular Imprints Inc. (MII), the market and technology leader for nanopatterning systems and solutions, today announced it has developed a roll-based Jet and FlashÂ-® Imprint Lithography (J-FIL®)...

Read More »
Printing & Duplicating Equipment

Molecular Imprints Ships Its Next Generation Imprint Module System Targeted for Use in Semiconductor Memory Production

Molecular Imprints will ship three of its next generation imprint systems this quarter.-  Two of these systems are expected to be delivered to a leading semiconductor IDM. AUSTIN, Texas– Molecular Imprints, Inc. (MII), a technology leader in advanced semiconductor lithography and the market and technology leader for nanopatterning systems and solutions, today announced the shipment of the...

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Printing & Duplicating Equipment

Molecular Imprints Ships Its Next Generation Imprint Module System Targeted for Use in Semiconductor Memory Production

Molecular Imprints will ship three of its next generation imprint systems this quarter.Â-  Two of these systems are expected to be delivered to a leading semiconductor IDM. AUSTIN, Texas– Molecular Imprints, Inc. (MII), a technology leader in advanced semiconductor lithography and the market and technology leader for nanopatterning systems and solutions, today announced the shipment of the...

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Molecular Imprints, Inc. (MII) Delivers Industry's First 450mm Advanced Lithography System to a Leading Semiconductor Manufacturer in Support of the Global 450mm Initiative
Computer Hardware & Peripherals

Molecular Imprints, Inc. (MII) Delivers Industry's First 450mm Advanced Lithography System to a Leading Semiconductor Manufacturer in Support of the Global 450mm Initiative

MII's J-FIL(TM) Technology Accelerating the Semiconductor Industry's Adoption to 450mm Manufacturing by 2 Years AUSTIN, Texas- Molecular Imprints, Inc., a technology leader in advanced semiconductor lithography, today announced the delivery of the first advanced lithography platform capable of patterning 450mm silicon wafer substrates. The Imprio(-®) 450, was accepted by a leading semiconductor...

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Molecular Imprints, Inc. (MII) Delivers Industry's First 450mm Advanced Lithography System to a Leading Semiconductor Manufacturer in Support of the Global 450mm Initiative
Computer Hardware & Peripherals

Molecular Imprints, Inc. (MII) Delivers Industry's First 450mm Advanced Lithography System to a Leading Semiconductor Manufacturer in Support of the Global 450mm Initiative

MII's J-FIL(TM) Technology Accelerating the Semiconductor Industry's Adoption to 450mm Manufacturing by 2 Years AUSTIN, Texas- Molecular Imprints, Inc., a technology leader in advanced semiconductor lithography, today announced the delivery of the first advanced lithography platform capable of patterning 450mm silicon wafer substrates. The Imprio(Â-®) 450, was accepted by a leading...

Read More »
Printing & Duplicating Equipment

Nanoimprint Mask Replicator serves semiconductor industry.

Perfecta(TM) MR5000 Jet and Flash(TM) Imprint Lithography imprint mask replication platform enables multiple identical replica masks to be fabricated from one e-beam master. Taking e-beam written leading-edge 6025 master masks, nanopatterning system transfers patterns flawlessly onto 6025 replicas that can be accepted by manufacturing wafer imprint lithography system. System dispenses picoliter...

Read More »
Printing & Duplicating Equipment

Nanoimprint Mask Replicator serves semiconductor industry.

Perfecta(TM) MR5000 Jet and Flash(TM) Imprint Lithography imprint mask replication platform enables multiple identical replica masks to be fabricated from one e-beam master. Taking e-beam written leading-edge 6025 master masks, nanopatterning system transfers patterns flawlessly onto 6025 replicas that can be accepted by manufacturing wafer imprint lithography system. System dispenses picoliter...

Read More »
Material Handling & Storage

Inkjet System offers nanopatterning for HDD manufacturing.

NuTera HD7000 helps HDD manufacturers extend areal density roadmaps beyond 1 TB/in.-², resulting in optimized storage capacity in SFF devices. As Jet and Flash(TM) Imprint Lithography platform, nanopatterning system designed for patterned media pilot- and volume-manufacturing, product enables sub-20 nm lithography at production speeds and offers throughput of 300+ double-sided disks/hr. Solution...

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Material Handling & Storage

Inkjet System offers nanopatterning for HDD manufacturing.

NuTera HD7000 helps HDD manufacturers extend areal density roadmaps beyond 1 TB/in.Â-², resulting in optimized storage capacity in SFF devices. As Jet and Flash(TM) Imprint Lithography platform, nanopatterning system designed for patterned media pilot- and volume-manufacturing, product enables sub-20 nm lithography at production speeds and offers throughput of 300+ double-sided disks/hr....

Read More »
Optics & Photonics

Molecular Imprints J-FIL Technology Has Now Demonstrated the Ability to Produce High Performance Wire Grid Polarizers for Use in Flat Panel Displays

- Large area wire grid polarizers with feature sizes of 50nm and below will increase the resolution, reduce the power consumption and lower the cost of a flat panel display AUSTIN, Texas – Molecular Imprints Inc. (MII), the market and technology leader for nanopatterning systems and solutions, today announced it has developed a roll-based Jet and Flash-® Imprint Lithography (J-FIL®)...

Read More »
Optics & Photonics

Molecular Imprints J-FIL Technology Has Now Demonstrated the Ability to Produce High Performance Wire Grid Polarizers for Use in Flat Panel Displays

- Large area wire grid polarizers with feature sizes of 50nm and below will increase the resolution, reduce the power consumption and lower the cost of a flat panel display AUSTIN, Texas – Molecular Imprints Inc. (MII), the market and technology leader for nanopatterning systems and solutions, today announced it has developed a roll-based Jet and FlashÂ-® Imprint Lithography (J-FIL®)...

Read More »
Printing & Duplicating Equipment

Molecular Imprints Ships Its Next Generation Imprint Module System Targeted for Use in Semiconductor Memory Production

Molecular Imprints will ship three of its next generation imprint systems this quarter.-  Two of these systems are expected to be delivered to a leading semiconductor IDM. AUSTIN, Texas– Molecular Imprints, Inc. (MII), a technology leader in advanced semiconductor lithography and the market and technology leader for nanopatterning systems and solutions, today announced the shipment of the...

Read More »
Printing & Duplicating Equipment

Molecular Imprints Ships Its Next Generation Imprint Module System Targeted for Use in Semiconductor Memory Production

Molecular Imprints will ship three of its next generation imprint systems this quarter.Â-  Two of these systems are expected to be delivered to a leading semiconductor IDM. AUSTIN, Texas– Molecular Imprints, Inc. (MII), a technology leader in advanced semiconductor lithography and the market and technology leader for nanopatterning systems and solutions, today announced the shipment of the...

Read More »
Molecular Imprints, Inc. (MII) Delivers Industry's First 450mm Advanced Lithography System to a Leading Semiconductor Manufacturer in Support of the Global 450mm Initiative
Computer Hardware & Peripherals

Molecular Imprints, Inc. (MII) Delivers Industry's First 450mm Advanced Lithography System to a Leading Semiconductor Manufacturer in Support of the Global 450mm Initiative

MII's J-FIL(TM) Technology Accelerating the Semiconductor Industry's Adoption to 450mm Manufacturing by 2 Years AUSTIN, Texas- Molecular Imprints, Inc., a technology leader in advanced semiconductor lithography, today announced the delivery of the first advanced lithography platform capable of patterning 450mm silicon wafer substrates. The Imprio(-®) 450, was accepted by a leading semiconductor...

Read More »
Molecular Imprints, Inc. (MII) Delivers Industry's First 450mm Advanced Lithography System to a Leading Semiconductor Manufacturer in Support of the Global 450mm Initiative
Computer Hardware & Peripherals

Molecular Imprints, Inc. (MII) Delivers Industry's First 450mm Advanced Lithography System to a Leading Semiconductor Manufacturer in Support of the Global 450mm Initiative

MII's J-FIL(TM) Technology Accelerating the Semiconductor Industry's Adoption to 450mm Manufacturing by 2 Years AUSTIN, Texas- Molecular Imprints, Inc., a technology leader in advanced semiconductor lithography, today announced the delivery of the first advanced lithography platform capable of patterning 450mm silicon wafer substrates. The Imprio(Â-®) 450, was accepted by a leading...

Read More »
Printing & Duplicating Equipment

Nanoimprint Mask Replicator serves semiconductor industry.

Perfecta(TM) MR5000 Jet and Flash(TM) Imprint Lithography imprint mask replication platform enables multiple identical replica masks to be fabricated from one e-beam master. Taking e-beam written leading-edge 6025 master masks, nanopatterning system transfers patterns flawlessly onto 6025 replicas that can be accepted by manufacturing wafer imprint lithography system. System dispenses picoliter...

Read More »
Printing & Duplicating Equipment

Nanoimprint Mask Replicator serves semiconductor industry.

Perfecta(TM) MR5000 Jet and Flash(TM) Imprint Lithography imprint mask replication platform enables multiple identical replica masks to be fabricated from one e-beam master. Taking e-beam written leading-edge 6025 master masks, nanopatterning system transfers patterns flawlessly onto 6025 replicas that can be accepted by manufacturing wafer imprint lithography system. System dispenses picoliter...

Read More »
Material Handling & Storage

Inkjet System offers nanopatterning for HDD manufacturing.

NuTera HD7000 helps HDD manufacturers extend areal density roadmaps beyond 1 TB/in.-², resulting in optimized storage capacity in SFF devices. As Jet and Flash(TM) Imprint Lithography platform, nanopatterning system designed for patterned media pilot- and volume-manufacturing, product enables sub-20 nm lithography at production speeds and offers throughput of 300+ double-sided disks/hr. Solution...

Read More »
Material Handling & Storage

Inkjet System offers nanopatterning for HDD manufacturing.

NuTera HD7000 helps HDD manufacturers extend areal density roadmaps beyond 1 TB/in.Â-², resulting in optimized storage capacity in SFF devices. As Jet and Flash(TM) Imprint Lithography platform, nanopatterning system designed for patterned media pilot- and volume-manufacturing, product enables sub-20 nm lithography at production speeds and offers throughput of 300+ double-sided disks/hr....

Read More »

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