Kurt J. Lesker Co.
Jefferson Hills, PA 15025
Kurt J. Lesker Company® Awarded a Patent for its Hermetically Sealed Cathode Design
Jefferson Hills, PA, The Kurt J. Lesker Company is pleased to announce that it has been awarded a United States patent titled “Hermetically Sealed Magnetic Keeper Cathode” dated October 30th, 2018. The patent, granted for the company’s advanced sputtering cathode, covers a novel design which dramatically reduces the number of seals in a cathode, while increasing user friendliness and...
Read More »Kurt J. Lesker Company-® Awarded a Patent for its Hermetically Sealed Cathode Design
Jefferson Hills, PA, The Kurt J. Lesker Company is pleased to announce that it has been awarded a United States patent titled “Hermetically Sealed Magnetic Keeper Cathode” dated October 30th, 2018. The patent, granted for the company’s advanced sputtering cathode, covers a novel design which dramatically reduces the number of seals in a cathode, while increasing user friendliness and...
Read More »TORUS® Power Supply Packages feature flex assembly.
TORUS® Magnetron and Power Supply Packages come with cables and connectors. Units are offered in 2 in., 3 in., or 4 in. TORUS Mag Keeper™ sputtering source and are equipped with standard magnets. Product’s source can be integrated with DC or RF power supply.
Read More »TORUS-® Power Supply Packages feature flex assembly.
TORUS® Magnetron and Power Supply Packages come with cables and connectors. Units are offered in 2 in., 3 in., or 4 in. TORUS Mag Keeper™ sputtering source and are equipped with standard magnets. Product’s source can be integrated with DC or RF power supply.
Read More »NANO 36™ Deposition System is compatible with multiple deposition techniques.
NANO 36™ Thin Film Deposition System is designed for use within the controlled atmosphere of a glove box. Featuring multiple substrate fixture options, system comes with enhanced deposition capabilities and substrate platen options. NANO 36™ is suitable for glovebox integration.
Read More »NANO 36⢠Deposition System is compatible with multiple deposition techniques.
NANO 36™ Thin Film Deposition System is designed for use within the controlled atmosphere of a glove box. Featuring multiple substrate fixture options, system comes with enhanced deposition capabilities and substrate platen options. NANO 36™ is suitable for glovebox integration.
Read More »IMPULSE™ 2-2 Pulsed Power Module feature a positive kick function.
IMPULSE™ 2-2 Pulsed Power Module is available in single and dual configurations. Enabling high-power impulse magnetron sputtering (HiPIMS), the unit offers both front panel and remote control options with up to five user-selectable storage presets. Module’s positive kick function increases deposition rate, clearing charges and broadens the process envelope. The dual configuration model can...
Read More »IMPULSE⢠2-2 Pulsed Power Module feature a positive kick function.
IMPULSE™ 2-2 Pulsed Power Module is available in single and dual configurations. Enabling high-power impulse magnetron sputtering (HiPIMS), the unit offers both front panel and remote control options with up to five user-selectable storage presets. Module’s positive kick function increases deposition rate, clearing charges and broadens the process envelope. The dual configuration model can...
Read More »IMPULSE's HiPIMS Power Supply feature remote control options.
Offered in Single and Dual configurations, the IMPULSE’s HiPIMS Power Supply gives 2kW output. Ideally used in process development and RD applications, HiPIMS' dual configuration powers 2 independent sources of up to 2kW each. Units can be set for either “master” or “slave” mode to run 4kW into a single source. Using the Dual option, the DC bias option can be set. Power supply features...
Read More »IMPULSE's HiPIMS Power Supply feature remote control options.
Offered in Single and Dual configurations, the IMPULSE’s HiPIMS Power Supply gives 2kW output. Ideally used in process development and RD applications, HiPIMS' dual configuration powers 2 independent sources of up to 2kW each. Units can be set for either “master” or “slave” mode to run 4kW into a single source. Using the Dual option, the DC bias option can be set. Power supply features...
Read More »Kurt J. Lesker Company® Awarded a Patent for its Hermetically Sealed Cathode Design
Jefferson Hills, PA, The Kurt J. Lesker Company is pleased to announce that it has been awarded a United States patent titled “Hermetically Sealed Magnetic Keeper Cathode” dated October 30th, 2018. The patent, granted for the company’s advanced sputtering cathode, covers a novel design which dramatically reduces the number of seals in a cathode, while increasing user friendliness and...
Read More »Kurt J. Lesker Company-® Awarded a Patent for its Hermetically Sealed Cathode Design
Jefferson Hills, PA, The Kurt J. Lesker Company is pleased to announce that it has been awarded a United States patent titled “Hermetically Sealed Magnetic Keeper Cathode” dated October 30th, 2018. The patent, granted for the company’s advanced sputtering cathode, covers a novel design which dramatically reduces the number of seals in a cathode, while increasing user friendliness and...
Read More »TORUS® Power Supply Packages feature flex assembly.
TORUS® Magnetron and Power Supply Packages come with cables and connectors. Units are offered in 2 in., 3 in., or 4 in. TORUS Mag Keeper™ sputtering source and are equipped with standard magnets. Product’s source can be integrated with DC or RF power supply.
Read More »TORUS-® Power Supply Packages feature flex assembly.
TORUS® Magnetron and Power Supply Packages come with cables and connectors. Units are offered in 2 in., 3 in., or 4 in. TORUS Mag Keeper™ sputtering source and are equipped with standard magnets. Product’s source can be integrated with DC or RF power supply.
Read More »NANO 36™ Deposition System is compatible with multiple deposition techniques.
NANO 36™ Thin Film Deposition System is designed for use within the controlled atmosphere of a glove box. Featuring multiple substrate fixture options, system comes with enhanced deposition capabilities and substrate platen options. NANO 36™ is suitable for glovebox integration.
Read More »NANO 36⢠Deposition System is compatible with multiple deposition techniques.
NANO 36™ Thin Film Deposition System is designed for use within the controlled atmosphere of a glove box. Featuring multiple substrate fixture options, system comes with enhanced deposition capabilities and substrate platen options. NANO 36™ is suitable for glovebox integration.
Read More »IMPULSE™ 2-2 Pulsed Power Module feature a positive kick function.
IMPULSE™ 2-2 Pulsed Power Module is available in single and dual configurations. Enabling high-power impulse magnetron sputtering (HiPIMS), the unit offers both front panel and remote control options with up to five user-selectable storage presets. Module’s positive kick function increases deposition rate, clearing charges and broadens the process envelope. The dual configuration model can...
Read More »IMPULSE⢠2-2 Pulsed Power Module feature a positive kick function.
IMPULSE™ 2-2 Pulsed Power Module is available in single and dual configurations. Enabling high-power impulse magnetron sputtering (HiPIMS), the unit offers both front panel and remote control options with up to five user-selectable storage presets. Module’s positive kick function increases deposition rate, clearing charges and broadens the process envelope. The dual configuration model can...
Read More »IMPULSE's HiPIMS Power Supply feature remote control options.
Offered in Single and Dual configurations, the IMPULSE’s HiPIMS Power Supply gives 2kW output. Ideally used in process development and RD applications, HiPIMS' dual configuration powers 2 independent sources of up to 2kW each. Units can be set for either “master” or “slave” mode to run 4kW into a single source. Using the Dual option, the DC bias option can be set. Power supply features...
Read More »IMPULSE's HiPIMS Power Supply feature remote control options.
Offered in Single and Dual configurations, the IMPULSE’s HiPIMS Power Supply gives 2kW output. Ideally used in process development and RD applications, HiPIMS' dual configuration powers 2 independent sources of up to 2kW each. Units can be set for either “master” or “slave” mode to run 4kW into a single source. Using the Dual option, the DC bias option can be set. Power supply features...
Read More »