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Power Delivery System suits semiconductor etch applications.
Fully integrated VHF Ovation(TM) delivers power up to 2.7 kW at fixed 60 MHz. It features onboard plasma measurement and enables fast, high-precision processes such as those required for sub-90 and sub-65 nm etch applications. Compact, half-rack unit delivers power into non 50 ohm environment without external sensor. It includes embedded voltage and current measurement technology for real-time...
Read More »Mass Flow Controllers target plasma process environments.
AreaÃ-® Transformer(TM) digital, multi-gas, multi-range MFCs provide field programmability to run any gas for any gas flow range from 10 sccm to 30 slm. As few as 8 different models can be used to support fab's requirements. Units allow unlimited gas selection without recalibration and can be pulled directly from customer's inventory shelf and programmed to meet requirements.
Read More »RF Plasma Sources have single chamer, foreline design.
Linear-inductive RPS 1501 and RPS 3001 offer integrated, RF power delivery to cylindrical plasma chambers for foreline abatement of perfluorinated compound (PFC) gases in 200 and 300 mm semiconductor etch processes. Products help destroy PFCs and convert them into compounds that can be removed by standard scrubbing technologies. Able to be turned on only when necessary, units can be retrofitted...
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