Strasbaugh
San Luis Obispo, CA 93401
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Wafer Cleaning System offers optimized process performance.
Model STB P300(TM) CMP System includes nVision II(TM) optical and motor current endpoint detection system, Saturn(TM) wafer carrier, Precision(TM) pad conditioner, and integrated cleaning capability. It is available in several configurations to suit needs of semiconductor, data storage, SOI, silicon, and MEMS manufacturing.
Read More »Endpoint Detection System optimizes CMP systems.
Designed for IPEC 372 and 472 Chemical Mechanical Polishing systems, nVision II Optical Endpoint Detection Upgrade monitors optical, motor current, and pad temperature signals to determine precise endpoint for both metal and thin film CMP applications in semiconductor, data storage, and MEMS manufacturing markets. System includes intuitive software with full color GUI, endpoint recipe creation...
Read More »Wafer Cleaning System offers optimized process performance.
Model STB P300(TM) CMP System includes nVision II(TM) optical and motor current endpoint detection system, Saturn(TM) wafer carrier, Precision(TM) pad conditioner, and integrated cleaning capability. It is available in several configurations to suit needs of semiconductor, data storage, SOI, silicon, and MEMS manufacturing.
Read More »Endpoint Detection System optimizes CMP systems.
Designed for IPEC 372 and 472 Chemical Mechanical Polishing systems, nVision II Optical Endpoint Detection Upgrade monitors optical, motor current, and pad temperature signals to determine precise endpoint for both metal and thin film CMP applications in semiconductor, data storage, and MEMS manufacturing markets. System includes intuitive software with full color GUI, endpoint recipe creation...
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