Brewer Science, Inc.
Rolla, MO 65401
Mini-Environment Workstation provides chemical containment.
Featuring stand-alone design, Cee-® X-PRO Workstation enables complete process integration for pilot-scale production and commercial R/D prototyping. Upper enclosures can be designed for ductless or ducted exhaust to prevent vapor fumes from contaminating ambient lab environment. Offering virtual clean room environment, workstation- provides precision-controlled laboratory conditions that are...
Read More »Brewer Science Presents New Materials, Processes, and Equipment Innovation at SEMICON China and CSTIC
Brewer Science, the inventor of ARC-® anti-reflective coatings that have enabled the progress of advanced lithography, continues to deliver diverse technology solutions for FEOL and BEOL device fabrication which will be presented at the China Semiconductor Technology International Conference (CSTIC) and at SEMICON China, 19-21 March 2013, in Shanghai, China. Brewer Science will share...
Read More »Brewer Science Innovation Expands Lithography Limits with New Advanced Materials
Brewer Science, inventor of anti-reflective coatings for advanced lithography and a market leader for over thirty years, continues to push the limits of patterning technology with new innovative solutions in 2013. Building on its strong expertise in material design, Brewer Science continues to deliver more versatile lithography technologies. The new generations of ARC-® and OptiStack-®...
Read More »Thermal Slide Debonder works with semiconductor substrates.
Offering computerized process control, Cee-® 1300CSX enables high-temperature slide-off of thinned compound semiconductor substrates in R/D or low-volume production environment. Debonder is designed for maximum accuracy and process flexibility and offers several interface capabilities as well as precision lower platen z-position control and programmable electronic lift pins. Additional features...
Read More »Brewer Science to Exhibit Technologies of the Future for America's Defense at Nanotechnology Conference
Brewer Science, a global leader in developing and manufacturing specialty materials, integrated processes, and laboratory-scale wafer processing equipment, is exhibiting at the 10th Annual NanoTechnology for Defense (NT4D) Conference, 6-9 August 2012, at the Red Rock Resort in Summerlin, Nevada. Initiated a decade ago by the Air Force Research Laboratory, the Army Research Laboratory, the Office...
Read More »Brewer Science Introduces Thin Wafer Handling Systems for Compound Semiconductor Device Processing
Brewer Science, Inc., introduces new wafer processing equipment designed for thin wafer separation and post-debonding cleaning, steps that are critical for ultrasensitive compound semiconductor (CS) device processing. These latest equipment designs enable thin wafer handling technologies that can broaden your process window and lower your total cost of ownership by reducing yield loss and...
Read More »Brewer Science Announces New OptiStack® System of Products, The Most Versatile Multilayer Solution on the Market
Brewer Science, the inventor of ARC-® coatings and market leader for advanced patterning materials, is pushing the limits of patterning technology and process flexibility with the next generation of its OptiStack-® system of products. Our focus is to give our customers more manufacturing options by providing flexible process solutions while reducing process cost. Our approach is to develop...
Read More »Brewer Science and SUSS MicroTec Jointly Commercialize ZoneBOND(TM) Technology for Thin Wafer Handling
Garching/Munich, GERMANY / ROLLA, MO, USA - Brewer Science, Inc., the inventor of ZoneBOND(TM) technology and world leading expert in materials and processes for thin wafer handling, and SUSS MicroTec, a leading supplier of equipment, are joining forces in commercializing ZoneBOND(TM) technology for thin wafer handling. SUSS MicroTec, market leader in room temperature debonding process equipment,...
Read More »Anti-Reflective Coating targets KrF photolithographers.
Designed to meet tightening specifications of 22 nm node and beyond, ARC-® DS-K101P developer-soluble bottom anti-reflective coating has less than 1 ppb ions, while maintaining broad resist compatibility and tunability. Tight n and k optical constants provide consistent performance, while developer solubility optimizes throughput by eliminating etch step.
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Bottom Anti-Reflective Coating suits ArF immersion lithography.
Providing broad photoresist compatibility and tuned optical properties, ARC-®29L ArF Immersion BARC is suited for use in dual layer BARC stack or as single layer BARC on SiON. Coating provides low reflectivities of less than 0.1% for film thicknesses of less than 40 nm. Product extends leading-edge immersion processes in both single- and double-patterning lithography schemes.
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