ThomasNet Industrial Newsroom -

Lithography System enables micropatterning of features.

info@productnews.com (ThomasNet Industrial Newsroom) — Mon, 14 Jul 2008 07:41:14 -0500

Utilizing Smart Filter technology, which incorporates micro-optical techniques to project master images directly onto diverse substrates, maskless SF-100 XTREME enables micropatterning of features as small as 1 micron. System features precise substrate movement and inline, confocal camera system to optimize overall system results. Users can customize SF-100 XTREME to provide precise energy levels, exposure wavelengths, and minimum feature sizes for application.

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Search for suppliers of: Photolithography Equipment & Supplies | Microlithography Equipment | Lithography Machinery

Imprint Lithography Tool meets semiconductor overlay needs.

info@productnews.com (ThomasNet Industrial Newsroom) — Wed, 27 Feb 2008 07:42:21 -0500

Leveraging S-FILÂ® (Step and Flash Imprint Lithography) technology, ImprioÂ® 300 is used for IC prototyping and process development at 32 nm node and beyond. It offers sub-10 nm resolution patterning in single exposure and can create dense, high-resolution structures in 2 dimensions. Drop-in technology - suitable for mix-and-match strategies where resolution advantage can be deployed on specific critical layers - is capable of meeting overlay requirements of semiconductor industry.

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Search for suppliers of: Semiconductor Equipment & Supplies | Imprinters & Imprinting Equipment | Prototyping Systems

Photomask Services image substrates coated with ITO.

info@productnews.com (ThomasNet Industrial Newsroom) — Thu, 25 Oct 2007 07:49:29 -0500

Photo Sciences uses multi-faceted micro lithography capabilities to pattern Indium Tin Oxide (ITO) coated substrates using direct-write laser, direct-write e-beam, optical reduction, and full field exposure lithography. Multi-level aligners expose and selectively etch other thin film metals and dielectrics, which can be layered with ITO patterns to create array of circuit and display configurations. Measurement and test equipment ensure that coatings meet thickness and resistance specifications.

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Chip Mask Creator provides complete ILT capability.

info@productnews.com (ThomasNet Industrial Newsroom) — Tue, 03 Jan 2006 07:06:17 -0500

Acting as replacement for Resolution Enhancement Technology (RET) software, Explorer uses Inverse Lithography Technology (ILT) platform to evaluate desired on-wafer pattern and mathematically determine mask features needed to produce intended silicon outcome. ILT analyzes entire image and generates globally optimized mask design in single pass. Combining software and hardware, Explorer features selectable e-beam or laser mask output format.

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Nanolithography System features active pen technology.

info@productnews.com (ThomasNet Industrial Newsroom) — Tue, 09 Nov 2004 07:45:48 -0500

Activeâ"¢ Pen Array transforms NSCRIPTOR System into multi-pen plotter for nanoscale. Each probe in array is addressable and able to move individually in Z-direction while scanning and writing. Active Pen includes microfabricated pens, electronics and interconnect modules, and alignment software. Each pen array consists of 8-pen configuration, having 6 central writing pens and 2 flanking reader probes. InkCADâ"¢ v3.0 software facilitates nanoscale tip-to-tip alignment.

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Nanolithography System includes bias voltage control option.

info@productnews.com (ThomasNet Industrial Newsroom) — Wed, 26 May 2004 07:43:46 -0500

NSCRIPTORâ"¢, suited for fabrication of nanoscale electronic components, incorporates bias control option that delivers functional capability of creating electric field between probe tip and sample substrate. This allows researcher to perform oxidation nanolithography and enables deposition of conductive nanoscale structures onto semiconductor surfaces via electrochemical Dip Pen Nanolithographyâ"¢ (DPNâ"¢) methods. System also incorporates multi-pen writing arrays.

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Nanolithography System helps build nanoscale structures.

info@productnews.com (ThomasNet Industrial Newsroom) — Wed, 21 May 2003 07:46:08 -0500

NSCRIPTORâ"¢ DPNWriterâ"¢ system allows researchers to build patterns, layers, and structures with virtually any molecule, at resolutions less than 15 nm with spacing as close as 5 nm. System includes closed-loop scanning with low thermal drift, 3-point leveling between scanning plane and sample, and InkCAD control for design, writing, and imaging capability. Environmental Chamber provides integrated temperature and humidity control.

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AFM System offers nanolithography and manipulation feature.

info@productnews.com (ThomasNet Industrial Newsroom) — Tue, 12 Nov 2002 09:08:02 -0500

MFP-3DÂ® AFM System consists of digital controller, Igor Pro software, and Nanopositioning system. With MicroAngelo feature, system allows nanolithography images to be imported from other programs or generated within software environment. Imported images are converted into series of contour lines which are then scaled and used to drive scanner to create lithographic image. Sensored, closed loop operation in all 3 axes provides sub-nanometer resolution over entire 100 Âµm scan range.

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Computer Hardware and Peripherals
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Search for suppliers of: Lithographic Equipment & Supplies | Scanners