ThomasNet Industrial Newsroom -

UV-NIL Step and Repeat System is designed for accuracy.

info@productnews.com (ThomasNet News) — Wed, 22 Jul 2009 08:30:25 -0500

UV-nanoimprint lithography (UV-NIL) step and repeat system, EVG770 Gen II NIL Stepper, incorporates abilities that promote process reliability, accuracy, and pattern fidelity at decreasing feature densities. While vacuum imprinting on spun-on polymer layer eliminates defect issues caused by trapped air bubbles, optical sensors align stamp and wafer into perfect parallelism for contact-free wedge compensation. Chuck movement, via non-contact bearing system, reduces particle contamination.

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Printing and Duplicating Equipment
Machinery and Machining Tools

Search for suppliers of: Lithographic Equipment & Supplies | Wafer Steppers

Module allows web handling on SHM 1400 and SHM 1450 series.

info@productnews.com (ThomasNet News) — Thu, 26 Mar 2009 08:27:41 -0500

Providing optimal decurler capability, T.I.P. WEB-0401 features heavy duty 3-bar motorized roller decurler assembly. Available in 12, 20, 30, 40, 50, and 75 mm dia, diameter of 3 decurler bars depend on machine/product details. Decurler needed for converting dedicated product can be selected by moving pin and rotating assembly using supplied handle and then reinserting pin to lock it. With remote adjustment, unit has less or no product markings.

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Machinery and Machining Tools
Material Handling and Storage Sponsored by: Reid Supply - FREE CAD Drawings of Tens-of-Thousands of Parts!

Search for suppliers of: Motorized Rollers | Moisturizing/Decurling Equipment | Assembly Systems | Roller Assemblies

EUV Light Source targets HVM testing applications.

info@productnews.com (ThomasNet News) — Fri, 06 Mar 2009 08:29:28 -0500

Operating at pulse rate of 10 kHz, EQ-10HR produces EUV light suited for infrastructure development for EUV lithography. It incorporates electrodeless Z-Pinch technology, which inductively couples current into discharge plasma, optimizing plasma control and stability and confining plasma away from source components. Product offers simplified integration into process tools and maintains repetition rate over billions of pulses.

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Optics and Photonics
Vision Systems
Printing and Duplicating Equipment

Search for suppliers of: Light Sources | Lithographic Equipment & Supplies

Desktop Nanofabrication System combines DPN, AFM processes.

info@productnews.com (ThomasNet News) — Tue, 24 Feb 2009 08:34:02 -0500

Utilizing Dip Pen Nanolithography® (DPN®) process, DPN 5000 system offers nanopatterning capabilities coupled with AFM (atomic force microscopy) imaging for immediate characterization of deposited patterns. Various custom MEMS-based ink delivery devices allow range of materials to be deposited under precisely controlled conditions. Included lithography software, InkCAD(TM) 4.0, offers functionality for control of tip-based patterning along with nanoscale mapping and positioning.

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Search for suppliers of: Microlithography Equipment | Lithography Machinery | Lithographic Equipment & Supplies

Maskless Lithography System offers scalable functionality.

info@productnews.com (ThomasNet News) — Wed, 04 Feb 2009 08:33:33 -0500

Providing 1 micron min feature size, SF-100 XPRESS can be custom-configured with various options to meet specific application requirements. Maskless exposure system utilizes Smart Filter technology, which incorporates micro-optical techniques to project master images directly onto diverse substrate materials. Serving researchers and manufacturers in various market segments, system capabilities may be added as dictated by technical requirements.

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Printing and Duplicating Equipment

Search for suppliers of: Lithographic Equipment & Supplies | Microlithography Equipment

Lithography System features microfluidics research option.

info@productnews.com (ThomasNet News) — Wed, 08 Oct 2008 07:39:33 -0500

SF-100 XTREME maskless photolithography system utilizes Smart Filter technology, which incorporates micro-optical techniques to rapidly project master images directly onto diverse substrate materials. Microfluidics Research Option test capabilities include varying excitation and emissions spectra, allowing for gray scale spatial illumination and fluorescence imaging and measuring particles in flow, including creating particle image velocimetry like conditions.

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Printing and Duplicating Equipment
Laboratory and Research Supplies and Equipment

Search for suppliers of: Photolithography Equipment & Supplies | Microlithography Equipment | Research & Development Equipment

Photolithography Stepper features high resolution lens.

info@productnews.com (ThomasNet News) — Thu, 25 Sep 2008 07:38:25 -0500

Based on step-and-repeat technology, Model 8700 PanelPrinter(TM) System features high performance lens that provides up to ±30 ppm real-time magnification adjustment via 6 degree of freedom reticle chuck, allowing every substrate to be compensated for, according to alignment results, ensuring precise alignment. Measuring 3.4 x 2.9 m, system can be configured with either 18709i or 18715i lens with resolution of 2.5 and 1.5 µm and depth of focus of 30 and 9 µm, respectively.

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Printing and Duplicating Equipment

Search for suppliers of: Photolithography Equipment & Supplies

Lithography System enables micropatterning of features.

info@productnews.com (ThomasNet News) — Mon, 14 Jul 2008 07:41:14 -0500

Utilizing Smart Filter technology, which incorporates micro-optical techniques to project master images directly onto diverse substrates, maskless SF-100 XTREME enables micropatterning of features as small as 1 micron. System features precise substrate movement and inline, confocal camera system to optimize overall system results. Users can customize SF-100 XTREME to provide precise energy levels, exposure wavelengths, and minimum feature sizes for application.

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Machinery and Machining Tools
Printing and Duplicating Equipment

Search for suppliers of: Lithography Machinery | Microlithography Equipment | Photolithography Equipment & Supplies

Imprint Lithography Tool meets semiconductor overlay needs.

info@productnews.com (ThomasNet News) — Wed, 27 Feb 2008 07:42:21 -0500

Leveraging S-FIL® (Step and Flash Imprint Lithography) technology, Imprio® 300 is used for IC prototyping and process development at 32 nm node and beyond. It offers sub-10 nm resolution patterning in single exposure and can create dense, high-resolution structures in 2 dimensions. Drop-in technology - suitable for mix-and-match strategies where resolution advantage can be deployed on specific critical layers - is capable of meeting overlay requirements of semiconductor industry.

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Printing and Duplicating Equipment
Test and Measuring Instruments

Search for suppliers of: Semiconductor Equipment & Supplies | Imprinters & Imprinting Equipment | Prototyping Systems

Photomask Services image substrates coated with ITO.

info@productnews.com (ThomasNet News) — Thu, 25 Oct 2007 07:49:29 -0500

Photo Sciences uses multi-faceted micro lithography capabilities to pattern Indium Tin Oxide (ITO) coated substrates using direct-write laser, direct-write e-beam, optical reduction, and full field exposure lithography. Multi-level aligners expose and selectively etch other thin film metals and dielectrics, which can be layered with ITO patterns to create array of circuit and display configurations. Measurement and test equipment ensure that coatings meet thickness and resistance specifications.

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Printing and Duplicating Equipment
Services

Search for suppliers of: Photomasks | Lithographers

Chip Mask Creator provides complete ILT capability.

info@productnews.com (ThomasNet News) — Tue, 03 Jan 2006 07:06:17 -0500

Acting as replacement for Resolution Enhancement Technology (RET) software, Explorer uses Inverse Lithography Technology (ILT) platform to evaluate desired on-wafer pattern and mathematically determine mask features needed to produce intended silicon outcome. ILT analyzes entire image and generates globally optimized mask design in single pass. Combining software and hardware, Explorer features selectable e-beam or laser mask output format.

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Printing and Duplicating Equipment

Search for suppliers of: Lithographic Equipment & Supplies

Nanolithography System features active pen technology.

info@productnews.com (ThomasNet News) — Tue, 09 Nov 2004 07:45:48 -0500

Activeâ"¢ Pen Array transforms NSCRIPTOR System into multi-pen plotter for nanoscale. Each probe in array is addressable and able to move individually in Z-direction while scanning and writing. Active Pen includes microfabricated pens, electronics and interconnect modules, and alignment software. Each pen array consists of 8-pen configuration, having 6 central writing pens and 2 flanking reader probes. InkCADâ"¢ v3.0 software facilitates nanoscale tip-to-tip alignment.

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Printing and Duplicating Equipment

Nanolithography System includes bias voltage control option.

info@productnews.com (ThomasNet News) — Wed, 26 May 2004 07:43:46 -0500

NSCRIPTORâ"¢, suited for fabrication of nanoscale electronic components, incorporates bias control option that delivers functional capability of creating electric field between probe tip and sample substrate. This allows researcher to perform oxidation nanolithography and enables deposition of conductive nanoscale structures onto semiconductor surfaces via electrochemical Dip Pen Nanolithographyâ"¢ (DPNâ"¢) methods. System also incorporates multi-pen writing arrays.

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Printing and Duplicating Equipment

Nanolithography System helps build nanoscale structures.

info@productnews.com (ThomasNet News) — Wed, 21 May 2003 07:46:08 -0500

NSCRIPTORâ"¢ DPNWriterâ"¢ system allows researchers to build patterns, layers, and structures with virtually any molecule, at resolutions less than 15 nm with spacing as close as 5 nm. System includes closed-loop scanning with low thermal drift, 3-point leveling between scanning plane and sample, and InkCAD control for design, writing, and imaging capability. Environmental Chamber provides integrated temperature and humidity control.

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Printing and Duplicating Equipment

AFM System offers nanolithography and manipulation feature.

info@productnews.com (ThomasNet News) — Tue, 12 Nov 2002 09:08:02 -0500

MFP-3D® AFM System consists of digital controller, Igor Pro software, and Nanopositioning system. With MicroAngelo feature, system allows nanolithography images to be imported from other programs or generated within software environment. Imported images are converted into series of contour lines which are then scaled and used to drive scanner to create lithographic image. Sensored, closed loop operation in all 3 axes provides sub-nanometer resolution over entire 100 µm scan range.

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Computer Hardware and Peripherals
Printing and Duplicating Equipment

Search for suppliers of: Scanners | Lithographic Equipment & Supplies