FEI Company    Hillsboro, OR 97124
Apr 02, 2013 Combining scanning electron microscope and X-ray spectrometer, ASPEX CleanCHK™ Analyzer monitors automotive part cleanliness by providing particulate data within minutes. Advanced software routines automatically detect and count particles and analyze particle size, shape, and composition. Designed for use on production floor, analyzer offers automated sample set-up, calibration, and analysis; menu-based operation; and ability to report results in several industry standard formats.

FEI Company    Hillsboro, OR 97124
Feb 05, 2013 Part of integrated workflow, Tecnai Arctica™ incorporates automation, pioneered on FEI’s flagship Titan Krios™ TEM, to elucidate 3D structure of biological macromolecules and molecular complexes. Cryo-sample autoloader, combined automated target identification, and low dose imaging enable unattended acquisition of large SPA data sets. UI and automation of routine operations and set up procedures lower threshold of operator expertise.

Olympus Europa Holding GmbH    Hamburg 20097  Germany
Dec 05, 2012 Suited for life science applications such as FRAP, FLIP, and photo-activation, FluoView FV1200 boosts sensitivity of laser scanning microscopy with living cells or unstable fluorophores. System combines accuracy of IX83 frame with fluorescence sensitivity and simultaneous laser stimulation of cells. Reflective, silver-coated galvanometer scanning mirrors and dual-channel GaAsP FluoView PMT module maximize light transfer and detection, allowing for laser power reduction.

FEI Company    Hillsboro, OR 97124
Nov 26, 2012 Combining scanning electron microscope for imaging and focused ion beam for milling and deposition, Helios NanoLab™ 450 F1 DualBeam™ System provides semiconductor manufacturers with optimal images of device architectures. STEM detector delivers material contrast, while FlipStage™ 3 flips sample between thinning and STEM viewing positions, and rotation axis permits viewing from either side. To support automated lift-out, EasyLift™ nanomanipulator provides precise motorized sample manipulation.

FEI Company    Hillsboro, OR 97124
Aug 31, 2012 Respectively accommodating up to 100 mm samples and full 300 mm wafers, Helios NanoLab(TM) 450HP and 1200HP DualBeam(TM) systems meet requirements for semiconductor process development at 28 nm device geometry node and below. Systems can prepare 15 nm thick samples with less than 2 nm damage layer in 90 min. QuickFlip grid holders facilitate inverted sample preparation, and iFast(TM) automation software optimizes usability while ensuring consistency among multiple operators and systems.

Carl Zeiss Jena GmbH Zeiss Gruppe Mikroskopie      Germany
Aug 14, 2012 Featuring plug-and-play design, MERLIN Compact, MERLIN VP Compact, and MERLIN allow users to add and change detectors to handle tasks ranging from simple image capture to extensive material analysis. Frame store of 32 k x 24 k pixels allows imaging of very large areas. In addition to in-situ 3D surface reconstruction and calculation of 3D data from 2D data, FE-SEMs include in-lens Duo detector offering both high resolution imaging and extensive materials information.

Carl Zeiss Jena GmbH Zeiss Gruppe Mikroskopie      Germany
Aug 14, 2012 With its electronics, detectors, and chamber design, SIGMA HD Field Emission Scanning Electron Microscope (FE-SEM) accelerates imaging and facilitates sample navigation for nanoscale analytics. High vacuum and variable pressure modes of operation are available, and 5-axis eucentric stage aids sample navigation using translational and tilted movement. Also included, diametrically opposite chamber ports facilitate mounting of 2 energy dispersive X-ray spectroscopy detectors.

Vitiny    Dashu Township   Taiwan
Aug 13, 2012 Integrating color 2.7 in. TFT LCD screen and 4 ultra white LEDs, VT300 can be used for real-time observation and recording. Scale is shown on display, and zoom options include 10x and 42x (optical) as well as smart zoom (digital); max magnification is 196x. Images/video can be saved to built-in 2G memory, and scale value changes with magnification size. Also included, software for PC covers angle, line, diameter, and chamfer measurement, image comparison, and video control.

FEI Company    Hillsboro, OR 97124
Aug 08, 2012 Verios(TM) XHR SEM provides resolution and contrast needed for precise measurements on beam-sensitive materials in semiconductor manufacturing and materials science applications. When combined with IC3D(TM) software, instrument can provide measurements needed to control processes at 22 nm technology node and below. User can switch between operating conditions, maintain sample cleanliness, and obtain sub-nanometer resolution at any accelerating voltage from 1-30 kV.

FEI Company    Hillsboro, OR 97124
Jul 31, 2012 Titan(TM) ETEM G2 enables time-resolved, in-situ studies of processes and materials exposed to reactive gases and elevated temperatures. With this environmental transmission electron microscope (ETEM), developers of energy and environmental products can study relationships between structure and performance by observing atomic scale processes and gas-solid interactions under conditions that mimic operational environment. UI accelerates switching between ETEM and high vacuum modes.

Olympus America, Inc.    Center Valley, PA 18034
May 10, 2012 Intended for inspection, test, and quality control facilities, DSX Series Micro-Imaging and Metrology Systems capture clear images, acquire traceable measurements, and perform high-level analyses with tap of touchscreen. Units accommodate samples of all shapes and sizes to produce 2D, 3D, and panorama results. Built to resist ambient vibration with image stabilization technology, DSX systems are compatible with Stream image-processing software for measurement, analysis, and reporting.

Keyence Corporation of America    Elmwood Park, NJ 07407
Apr 27, 2012 To streamline testing as well as increase inspection speed and efficiency, VHX-2000 integrates zoom optics with CCD camera, 17 in. LCD monitor, light source, controller, and analysis/reporting software. Magnification range is 0.1x-5000x, and various lighting techniques are supported. In addition to optional motorized XY stage and Z-axis lens control, features include color filter wheel, super resolution mode, and image stitching function.

Tescan USA, Inc    Cranberry Township, PA 16066
Oct 11, 2011 FERA3 XMH high resolution Schottky Field Emission scanning electron microscope (FESEM) integrates plasma source focused ion beam. Along with electron and ion columns, unit can be configured with gas injection systems, nano-manipulators, and detectors/microanalyzers. Use of Xenon plasma source for focused ion beam enables system to satisfy high-resolution FIB requirements (imaging, fine milling/polishing) as well as achieve ion currents greater than 1 µA for ultra-fast material removal rates.

Saelig Co., Inc.    Pittsford, NY 14534
Aug 25, 2011 Featuring white LED illumination and color 2 MP sensor, MV200UM captures magnified images and video for display on Windows®-based PC via USB 2.0 connection. Dual interchangeable clear ring-stands of different heights allow separation from objects, providing up to 200x magnification on 17 in. monitor with 1,280 x 1,024 resolution. Unit can also be handheld at distances of 8-200 mm for inspecting parts at lower magnification, and fields of view can range from 1.9 x 1.5 mm to 82 x 65 mm.

Aven, Inc.    Ann Arbor, MI 48108
Aug 16, 2011 With magnification range of 15x-200x and optical zoom capability of 10x or 40x, iLoupe XL2 displays enlarged views on 2.8 in. color LCD screen. Still or video images are captured by 2 MP CMOS sensor and stored in flash memory drive with 2 GB capacity. Using included measurement program, users can record length, perimeter, angle, and surface area of examined objects. Rechargeable battery-powered instrument may also be used as webcam by linking to computer via USB cable.

FEI Company    Hillsboro, OR 97124
Aug 11, 2011 Combining electron optics with analytical sensitivity of ChemiSTEM Technology, Titan(TM) G2 80-200 provides atomic resolution elemental mapping over entire accelerating voltage range of 200-80 kV. System includes X-FEG high brightness gun and DCOR probe corrector, achieving spatial resolution of 0.8 Angstroms in STEM and 0.9 Angstroms in TEM. Large tilt-range, when combined with ChemiSTEM's symmetrically distributed 4-silicon-drift x-ray detector architecture, permits EDX Tomography.

FEI Company    Hillsboro, OR 97124
Aug 11, 2011 Capable of providing high resolution, 3D imaging and analysis on range of sample types, Versa 3D(TM) DualBeam(TM) system lets users adapt capabilities to specific requirements. Configurable platform, available with high-vacuum only or high- and low-vacuum electron imaging hardware, combines Schottky field emission electron beam and high-throughput ion beam technologies. It may also be configured with environmental scanning electron microscopy (ESEM) for in-situ analysis.

Keyence Corporation of America    Elmwood Park, NJ 07407
Jul 06, 2011 Utilizing short-wavelength laser, VK-X Series provides non-contact profile, roughness, and thickness measurements, even on surfaces with highly angular surfaces. System features 0.5 nm Z-axis resolution with magnification range from 200-24,000x and ability to capture images at up to 21.6 MP. By combining laser with 16-bit photomultiplier, VK-X Series can obtain image and measurement on nearly any type of material. AI-Scan function enables users to image and measure target with click of mouse.

Keyence Corporation of America    Elmwood Park, NJ 07407
Jun 24, 2011 Incorporating CMOS sensor, light source, LED monitor, analysis software, and PC components, Model VW-9000 records up to 230,000 fps and can capture video for up to 13 hours. Recorded footage can be edited and analyzed directly on controller. Microscope automatically tracks moving objects in recorded footage to quantify speed, acceleration, distance, and angle. By graphically displaying changes in target's movement, Motion Graph function minimizes time needed to search for events of interest.

Ametek, Inc.    Wallingford, CT 06492
May 24, 2011 Intended for range of micro and nanoanalytical applications, SXFiveFE offers full automation for long-term unattended operation and features combination of field emission electron column and CAMECA spectrometers. Field emission source and electron column result in versatile microanalyzer with capabilities for quantitative microanalysis and x-ray imaging at sub-micron spatial resolution. Configurations include SXFive with W and LaB6 sources and SXFiveFE with FE source.