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Machinery & Machining Tools -> Tool Coating Machines


Tool Coating Machines




(Showing headlines 1 - 20)   more ....

Welding Consumables are engineered for extended life.

Hypertherm, Inc.    Hanover, NH 03755 0010
Aug 10, 2011 Intended for those who use Kjellberg Fine Focus 800 Plus system or HiFocus 280i/360i/440i systems and cut mild steel using either PB-S80 or PerCut 370.2 torch, Centricut consumables are engineered for optimal longevity, cut quality, and process reliability. Properties allow users to maintain cutting speeds required for their applications, and mild steel consumables are precision manufactured to tight tolerances so that cutting systems produce consistent, reliable performance.

Modular E-Coating System has footprint of only 2,000 sq. ft.

MetoKote Corp.    Lima, OH 45801
Nov 18, 2010 Designed for component suppliers and metal stamping companies, customizable mikroKote can fit against wall, around corner, or on mezzanine level. With standard capacity of 2 mil sq ft of coating per 8 hr shift, and 2 min cycle time in 13-stage process, component supplier can have e-coated parts in 2 hr. Unit includes optional wastewater treatment system.

Inline Flux Jetting System provides edge definition of 0.5-1 mm.

Asymtek    Carlsbad, CA 92008
Jul 13, 2010 In conjunction with DJ-2200 DispenseJet® valve with coaxial air technology, Spectrum® S-930N Series enables thin flux coatings as low as 5 microns. Selective flux jetting minimizes flux residue and overspray, while Fluidmove® for Windows® XP software controls amount of flux jetted to accommodate flip chips of varying bump heights. With small footprint of 23.6 x 52.0 in., fully enclosed, vented system includes safety interlocks and emergency stop.

Copper Barrier-Seed PVD System is intended for TSV packaging.

Copper Barrier-Seed PVD System is intended for TSV packaging.

Novellus Systems, Inc.    San Jose, CA 95134
Mar 12, 2010 For copper barrier-seed applications, INOVA® NExT PVD system features Hollow Cathode Magnetron (HCM) IONX source technology. Copper barrier-seed physical vapor deposition (PVD) process, intended for through-silicon-via (TSV) packaging market, delivers optimal sidewall and bottom coverage and enables void-free copper fill during subsequent TSV electroplating step. TSVs enable 3D packaging, where multiple chips are stacked on top of each other into one 3D module.

PVD System deposits copper barrier for memory chips.

Applied Materials, Inc.    Santa Clara, CA 95054
Sep 03, 2008 Applied Endura® Extensa(TM) PVD1 is used for depositing critical barrier films for copper interconnects in sub-55 nm memory chips. Its titanium/titanium nitride (Ti/TiN) process technology enables diffusion barrier films with optimal step coverage and less than 3% film thickness non-uniformity across wafer. Dual-magnet PVD source with flux-shaping side electromagnets enables defectivity below 10 particles at greater than/equal to 0.12 µm.

Electroplating System suits utility-scale solar equipment.

Electroplating System suits utility-scale solar equipment.

METFAB Technologies, Inc.    Warwick, RI 02888
Jul 09, 2008 Operating at continuous speeds up to 30 fpm, METFAB Solar Pipe Electroplating System electroplates metallic coating from 10-100 µin. to the surface of solar thermal power pipes and tubes to optimize heat absorption. Designed for processing tube and pipe from 1-3 in. OD and sheet up to 12 in. wide, it can apply specialty metallic coatings onto wide range of steels and alloys. Customizable aqueous process system includes all controls, electronics, hardware, and tanks.

Sputtering Targets produce high-purity SiC films.

Sputtering Targets produce high-purity SiC films.

Morgan Advanced Ceramics    New Bedford, MA 02745
Jun 02, 2008 Manufactured by chemical vapor deposition process, Silicon Carbide Sputtering Targets consist of homogenous, monolithic material with no particles. High density and lack of porosity results in negligible outgassing of target and makes it suitable for use in ultra-high vacuum conditions. Ranging in size from 3-20 in. diameter, targets are 99.9995% pure, enabling production of highly pure, uniform SiC films that ensure absence of etch residue from reactive ion etch processes.

Rotatable Targets assist thin film solar cell manufacturers.

Sputtering Materials, Inc.    Reno, NV 89523
Jan 21, 2008 High-density (99%+) CIG rotatable sputtering targets aid thin film solar manufacturers with casting of ternary alloy CuInGa (CIG). Density of material promotes control and material utilization. With 70% material utilization on rotatable and 25% on planar, spent targets can be reclaimed and re-cast to make new target. Process also works with materials such as In, InSn, Sn, Zn, Al, and SAC.

Consumable Kit facilitates 4 types of plasma cutting.

Hypertherm, Inc.    Hanover, NH 03755 0010
Dec 31, 2007 Intended for owners of Powermax1000®, 1250, or 1650 plasma systems, Consumable Kit includes shielded consumables for everyday drag cutting that involves following line or template. It also comes with unshielded consumables for cutting in tight places, gouging consumables for tough metal removal jobs, and FineCut consumables for precise cuts on thinner plate. Reference guide explains how to get best cut quality and consumable life when cutting with handheld torch.

RF Plasma Generators offer power levels up to 1,250 W.

RF Plasma Generators offer power levels up to 1,250 W.

T & C Power Conversions    Rochester, NY 14610
Sep 26, 2007 Housed in half rack package, XX Series can be controlled manually or via computer-controlled, rear panel analog or digital interfaces. RF stability of output power circuitry gives user control accuracies down to 1 W scales. Featuring ac inputs with Power Factor Correction, generators meet Safety Standards EN/UL 61010-1. Multiple units can be installed side by side in any enclosure or 19 in. equipment rack.

Evaporation Baskets promote line-of-sight coating.

Evaporation Baskets promote line-of-sight coating.

Ceramic Coating, Inc.    Beverly, MA 01915
Aug 14, 2007 Available in 6 sizes with wire diameters from .020-.050 in., Alumina Coated Evaporation Baskets are internally heated crucibles that permit vacuum evaporation of several metals simultaneously, and maintain molten metals evaporants as induction propelled spinning ball within cavity. Units completely evaporate most materials such as gold, nickel, palladium, and silver without loss to chamber. Inside depths range from .225-.975 in. and top IDs range from .150-.900 in.

Metallization System provides copper seed re-sputter.

Novellus Systems, Inc.    San Jose, CA 95134
Jul 31, 2007 Featuring advanced physical vapor deposition technology and ion-induced atomic layer deposition, 300 mm INOVA NExT with HCM IONX(TM) enables thin film barrier and copper seed deposition scalability for 32 nm node. System provides optimized metallic film overhang, step coverage, and film quality for tantalum barrier and copper seed processes. Differentiated source technology can be applied to other thin film metal applications, including titanium and aluminum.

Oxygen Consumables optmize cut time for mild steel.

Hypertherm, Inc.    Hanover, NH 03755 0010
Jun 14, 2007 Featuring power level of 50 A, cutting consumables are designed to optimize edge quality and speed of HyPerformance Plasma® systems when cutting mild steel with thickness between 22 gauge and 5/16 in. Consumables are available for HyPerformance Plasma HPR130 and HPR260 systems as well as HyDefinition® HD3070 and HD4070 systems retrofitted with HyPerformance Plasma torch.

Atmospheric Pressure Plasma System has no moving parts.

Atmospheric Pressure Plasma System has no moving parts.

Surfx Technologies LLC    Culver City, CA 90232
Jun 27, 2006 Atomflo(TM) generates stream of reactive gas for high-speed treatment of surfaces of all shapes and sizes prior to bonding, marking, painting, and coating. Designed to be hand-held or machine-mounted, aluminum plasma applicators deliver consistent and uniform treatment with linear beam sources from 1 in. to 1 ft. Plasma operates near room temperature at atmospheric pressure with reagent gas and primary helium or argon gas; process chemistry depends on reagent gas deployed.

Tool Coating Service targets automotive companies.

Tool Coating Service targets automotive companies.

SAMPUTENSILI    Bologna 40123  Italy
Aug 04, 2005 Aluminum and chromium-based Sunite® Alcrona Coating resists temperatures up to 1,100°C, making it suitable for dry gear cutting. It protects substrate from oxidation, minimizing negative interactions between tool and workpiece. Before tools are coated, grinding burrs are removed and surface is cleaned. Coating is then applied using Balzers furnace.

Sputter Coater has 4 in. diameter stage.

Sputter Coater has 4 in. diameter stage.

Anatech Ltd.    Denver, NC 28037
Sep 22, 2004 Hummer 6.6 facilitates coating of samples prior to scanning electron microscopy. With 4 in. diameter stage, unit accommodates up to 12 SEM pin stubs and up to 100 mm dia substrates.

Tool Coating permits high-speed milling of hardened steels.

Tool Coating permits high-speed milling of hardened steels.

Vega Tool Corporation    Schaumburg, IL 60173
Jun 14, 2004 Consisting of nano-composite material for hardness and resistance to oxidation, TH coating helps increase tool life, while improving finish quality of pre-hardened and hardened steels. Because coating generates little heat when machining, it is suited for dry cutting.

Tool Coating is used in milling and hobbing operations.

Tool Coating is used in milling and hobbing operations.

Balzers, Inc.    Elgin, IL 60123
Mar 12, 2004 With AlCrN (aluminum chromium nitride) formula, BALINIT® ALCRONA exhibits oxidation- and wear-resistance. It is suited for dry and wet machining of unalloyed steels as well as high-strength and high-hardness (up to 54 HRC) steels. Coating is also suited for use in applications involving heavy mechanical and thermal stresses.

TiAlN Tool Coating protects against wear.

TiAlN Tool Coating protects against wear.

Balzers, Inc.    Elgin, IL 60123
Apr 21, 2003 Suited for use in molding and stamping/forming applications, BALINIT® LUMENA nano-layered coating exhibits hardness of 3400 HV 0.05 and thickness from 8-15 µm. In molding, wear-resistant product offers optimized ratio between hardness and internal stress as well as protection against heat penetration into tool. For stamping and forming, coating absorbs shear stress and reduces heat transfer into tool. Product may be applied at lower temperatures than CVD and TD treatments.

Hardsurfacing Alloy suits high-impact/abrasion applications.

Hardsurfacing Alloy suits high-impact/abrasion applications.

Wall Colmonoy    Madison Heights, MI 48071
Nov 07, 2002 Developed for application with efficient PTA (Plasma Transferred Arc) deposition equipment, Colmonoy 80PTA is supplied as powder with uniform size distribution. Composite material contains high volume (60%) of abrasion resistant tungsten carbide particles (3500 DPH) in soft (HRC 30) impact-resistant nickel base matrix alloy. Tungsten carbide provides abrasion resistance while nickel matrix offers ductility and impact resistance.




(Showing headlines 1 - 20)   more ....



 Latest Products in the News


Nordson Corp.  - April 19, 2012
Nordson MARCH Plasma System Technology Displayed at SEMICON Singapore Booth #502

Pfeiffer Vacuum Inc.  - April 16, 2012
New Gas Analysis Systems from Pfeiffer Vacuum for Pressure Ranges up to 50 mbar

Nordson Plasma Systems Group  - March 19, 2012
Nordson MARCH Demonstrates Plasma Technology Expertise at SEMICON China

H.C. Starck, Inc.  - April 14, 2011
H.C. Starck's Thin Film PV Solutions on Display at Society of Vacuum Coaters TechCon 2011

Sulzer Metco  - August 26, 2010
New Compact Plasma Spray System (CPS)

American Trim  - November 10, 2008
PVD Coated Bumper Showcased at 2008 SEMA Show

Goodfellow Corp.  - February 28, 2008
Expanded Line of Sputtering Targets

Indium Corporation  - August 9, 2007
Indium Corporation Exhibits at European Photovoltaic Solar Energy Conference

CemeCon, Inc.  - April 21, 2007
Hard Machining Beyond the 50 HRc Limit

Advanced Energy Industries Inc.  - November 28, 2006
Advanced Energy® to Feature Award-Winning Aera® EPV Exhaust Pressure Controller for Advanced Processes at SEMICON® Japan 2006


More Products in the News...

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