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Electrical Equipment & Systems ->
Electron Beam Source
Electron Beam Source
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Precision Filament Power Supply has non-isolated design.UltraVolt Inc.
Ronkonkoma, NY 11779
Jun 25, 2007
Rated for 0-5 Vdc @ 0-3 A, center-tapped FIL-5V-3A operates in constant current (CC) regulated mode or constant voltage (CV) regulated mode and features automatic crossover between both. Output load regulation is less than 0.5% in CV mode and under 0.05% in CC mode. Between +26.4 and +21.6 Vdc, output line regulation is less than 0.01%. Product is suited for beam applications from electron guns to ion beams in equipment from focused ion beam workstations to mass spectrometers.
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Field Emission Gun suits 3D research and development.FEI Co.
Hillsboro, OR 97124-5830
Mar 05, 2007
Eliminating boundaries imposed by existing high vacuum systems, DualBeam(TM) Quanta(TM) 3D FEG features high-current ion column for rapid, site-specific cross-sections of samples to reveal sub-surface structures and features. System's electron source optimizes SEM imaging, while electron beam current enables high throughput spectroscopy.
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Ion Implanters utilize electron confinement technology.Axcelis Technologies Inc.
Beverly, MA 01915 1053
Apr 26, 2002 GSD Ultra and HC3 Ultra implanters enable high-volume production of ultra shallow junctions. Designed for 200 mm applications, GSD Ultra is based on GSD multi-wafer endstation. HC3 Ultra is designed for 300 mm manufacturing and offers high current processing from 0.2 to 80 keV. Packaging design of both implanters allows for easy maintenance access and maximum tool uptime. |
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