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Electrical Equipment & Systems -> Electron Beam Source

Electron Beam Source

(Showing headlines 1 - 13)   
Power Supplies serve electron-beam coating applications.

Power Supplies serve electron-beam coating applications.

Spellman High Voltage Electronics Corp.    Hauppauge, NY 11788
Apr 08, 2014 Comprising 3, 6, and 12 kW variants, rack-mount EVA Series thin film deposition power supplies are tolerant to transient and continuous arcing and utilize rugged IGBT Switch Mode design to limit stored energy and provide optimal regulation and ripple specifications. Arc intervention parameters can be optimized via GUI; adjustable values include arc quench, re-ramp, count, and arc rate limiters. Separate 1U rack-mount filament power controller and external filament transformer are optional.

Ion Implanters are suited for advanced 3D devices.

Axcelis Technologies Inc.    Beverly, MA 01915 1053
Feb 18, 2014 Purion M™ mid current implanter, Purion H™ high current implanter, and Purion XE™ high energy implanter are designed for advanced 3D devices. Systems include Purion Contamination Shield™ for lowest particles, undetectable metals, and no energy contamination; Purion Vector™ Dose and Angle Control system for precise and repeatable dopant placement; as well as Purion 500wph endstation cross-platform architecture that promotes productivity and manufacturing flexibility.

High Current Implanter delivers precise dopant placement.

Axcelis Technologies Inc.    Beverly, MA 01915 1053
Dec 10, 2013 Supporting manufacture of sub 16 nm planar and 3-D devices, Purion H Single Wafer Implanter features scanned spot beam technology with precision implant angle and dose control to optimize device performance and yield. Process control technology minimizes all forms of contaminants to ensure absolute beam purity. Cross-platform architecture is designed to drive manufacturing flexibility and lower total cost of fab operations.

Sterilizing System utilizes electron beam.

Nutek Corp.    Hayward, CA 94544
Nov 14, 2013 Suitable for sterilizing sensitive materials and complex products, SmartDose™ provides controls for simultaneous variable dose distribution, simultaneous dual beam redundancy, uninterrupted temperature controls, and intelligent tooling. Applications include allograft tissue, biomaterials, advanced polymers, drugs/biologics, and hydrogels as well as Teflon, implantables, bioabsorbables, bioresorbables, and combination devices.

Single Wafer High Energy Implanter offers precision, throughput.

Axcelis Technologies Inc.    Beverly, MA 01915 1053
May 09, 2013 Incorporating single wafer LINAC technology, Purion XE ion implanter enables high-yield manufacture of sub-16 nm planar and 3D devices. System incorporates 500+ wafers/hr end station and advanced filtration systems. Latter optimize beam purity, while angle control system and constant focal length scanning deliver precise and repeatable dopant placement. Scanned spot beam architecture enables control of damage engineering as well as other advanced processes.

Plasma Focused Ion Beam System targets advanced IC packaging.

Plasma Focused Ion Beam System targets advanced IC packaging.

FEI Co.    Hillsboro, OR 97124
Jun 15, 2011 Vion(TM) plasma focused ion beam system is used in advanced integrated circuit (IC) packaging applications that use larger scale structures to connect multiple chips in tightly integrated packages. System quickly delivers site-specific cross-sectional analysis to accelerate failure analysis of bumps, wire bonds, through silicon vias (TSVs), and stacked die; as well as site specific removal of package and other materials to enable failure analysis and fault isolation on buried die.

Field Emission Electron Probe Microanalyzer has high resolution.

Ametek, Inc.    Wallingford, CT 06492
May 24, 2011 Intended for range of micro and nanoanalytical applications, SXFiveFE offers full automation for long-term unattended operation and features combination of field emission electron column and CAMECA spectrometers. Field emission source and electron column result in versatile microanalyzer with capabilities for quantitative microanalysis and x-ray imaging at sub-micron spatial resolution. Configurations include SXFive with W and LaB6 sources and SXFiveFE with FE source.

Ion Source can analyze 96 samples in less than 10 min.

Prosolia, Inc.    Indianapolis, IN 46202
Dec 18, 2008 Based on Desorption Electrospray Ionization (DESI) technology, Omni Spray 2-D Ion Source has automated surface platform, which can handle samples up to 76 x 114 mm, size of standard 96 well micro-titer plate. Unit achieves step resolution down to 50 µm and and has open access sample stage that fits up to 3 standard Omni Slides(TM) or one Omni Slide - 96. Software controlled unit can perform surface imaging experiments at atmospheric pressure.

Floating Power Supply suits mass spectrometry applications.

Spellman High Voltage Electronics Corp.    Hauppauge, NY 11788
Aug 18, 2008 Used to power mass spectrometry microchannel plate detectors and electron multiplier applications, MCP Series features 3 kV, 330 µA output section that is floating and isolated to 16 kV. This facilitates referencing of output to voltage potentials other than ground and also provides inherent polarity reversibility. Customer-provided analog 0-10 Vdc programming signal will adjust supply from 0-100% of rated output voltage, and corresponding voltage feedback monitor signal is provided.

Integrated X-Ray Source does not need high-voltage cabling.

Spellman High Voltage Electronics Corp.    Hauppauge, NY 11788
Aug 07, 2008 XRB Monoblock® 80 kV, 100 W X-Ray source integrates high-voltage power supply, filament power supply, X-Ray tube, and control electronics. Additionally, fully sealed unit features PFC universal input, analog and digital (RS-232) interface, as well as options for fan- or cone-shaped X-Ray beam geometry. It can be mounted in any physical orientation and suits plating measurement, fill-level confirmation, and inspection applications.

Precision Filament Power Supply has non-isolated design.

UltraVolt, Inc.    Ronkonkoma, NY 11779
Jun 25, 2007 Rated for 0-5 Vdc @ 0-3 A, center-tapped FIL-5V-3A operates in constant current (CC) regulated mode or constant voltage (CV) regulated mode and features automatic crossover between both. Output load regulation is less than 0.5% in CV mode and under 0.05% in CC mode. Between +26.4 and +21.6 Vdc, output line regulation is less than 0.01%. Product is suited for beam applications from electron guns to ion beams in equipment from focused ion beam workstations to mass spectrometers.

Field Emission Gun suits 3D research and development.

FEI Co.    Hillsboro, OR 97124-5830
Mar 05, 2007 Eliminating boundaries imposed by existing high vacuum systems, DualBeam(TM) Quanta(TM) 3D FEG features high-current ion column for rapid, site-specific cross-sections of samples to reveal sub-surface structures and features. System's electron source optimizes SEM imaging, while electron beam current enables high throughput spectroscopy.

Ion Implanters utilize electron confinement technology.

Axcelis Technologies Inc.    Beverly, MA 01915 1053
Apr 26, 2002 GSD Ultra and HC3 Ultra implanters enable high-volume production of ultra shallow junctions. Designed for 200 mm applications, GSD Ultra is based on GSD multi-wafer endstation. HC3 Ultra is designed for 300 mm manufacturing and offers high current processing from 0.2 to 80 keV. Packaging design of both implanters allows for easy maintenance access and maximum tool uptime.

(Showing headlines 1 - 13)   

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