Product News: Optics & Photonics
Femtosecond Laser features working temperature of 15-35°C.
Press Release Summary:
July 6, 2011 - Based on diode-pumped disk laser technology, JenLasÂ® D2.fs emits pulse energies of 40 ÂµJ at 100 kHz repetition rate and can operate in 30-200 kHz range. Beam quality of MÂ² less than or equal to 1.25 near theoretical limit, together with pulse duration of less than or equal to 400 fs supports industrial applications. Some uses include 3D-micro material ablation of metal or polymer, thin layer ablation in semiconductor industry, or removal of dielectric layers on crystal solar cells.
Original Press Release
Jenoptik's Lasers & Material Processing Division: Femtosecond Laser for Optimal Application in Industry
Press release date: July 4, 2011
To ensure industry capability, every laser is subjected to strict type tests to guarantee safe function under typical conditions of transportation, storage and operation. This includes climate and shock tests, noise immunity to external electrical noise and compliance with the low EMC standards for electrical noise emission. Major features include ease of integration of the turn-key laser in complex machines and plants. For example, the actuation signal can be released by software or hardware.
Due to the specific properties of the impact of ultra-short femtosecond laser pulses on different materials, new laser applications can be found. For example, these laser pulses are excellent for all material processing applications for which minimal heat effects during processing are important. Another area includes processing inside of transparent materials, such as glass, transparent plastics and transparent function layers. A third and final field of application is the selective ablation of individual layers in multiple-layer systems consisting of different materials.
Concrete industry applications in these areas include the 3D-micro material ablation of metal or polymer (e.g., cutting of stents), thin layer ablation in the semiconductor industry or the removal of dielectric layers on crystal solar cells in photovoltaics. Other applications are the scribing of sapphire substrate, the processing of dental ceramics and the internal marking of glass.
JENOPTIK Laser GmbH Goeschwitzer Strasse 29 07745 Jena Phone: +49 3641 65-4300 l Fax: +49 3641 65-4399 jenoptik.com