Product News: Machinery & Machining Tools
Deposition System processes 6 in. dia or smaller wafers.
Press Release Summary:
August 10, 2007 - Able to process up to 100 wafers, EasyTube 6000 Chemical Vapor Deposition system is available with Atmospheric and Low-Pressure Chemical Vapor Deposition processes for research applications in semiconductor, MEM, nanotechnology, and solar cell markets. Multi-tube horizontal system is equipped with WINPRC real-time software to enable optimization of all process parameters and is designed specifically for research, university, and laboratory markets.
Original Press Release
First Nano Ships the First of Our EasyTube 6000 Series Deposition System Specifically Designed for the Research and University Laboratory Market
Press release date: August 2, 2007
The EasyTube 6000 is another addition to our line of EasyTube systems that are aimed at offering the research community quality performance, safe operation and production grade equipment at a low cost of ownership. All EasyTube systems are equipped with our proprietary WINPRC real-time software to enable optimization of all process parameters. The EasyTube 6000 has a small footprint, is modular in design and is offered with Atmospheric and Low- Pressure Chemical Vapor Deposition processes.
In the fourth quarter of 2007, we will be installing an EasyTube 6000 in our "Open Laboratory" to further our ongoing relationships with the research community. The system will be used for customer demonstration, material processing and developing additional processes for CNT, Solar and MEM applications. The system will give us nine (9) operational deposition systems in our laboratory for further product and materials development.
Source: CVD Equipment Corporation
CONTACT: Karen Hamberg of CVD Equipment Corporation, +1-631-981-7081, or Fax, +1-631-981-7095, or email@example.com
Web site: http://cvdequipment.com/