ThomasNet Home   |   Promote Your Business
Home  |   My ThomasNet News®  |   Industry Market Trends  |   Submit Release  |   Advertise  |   About Us Feb 14, 2012  

Wafer Cleaning System offers optimized process performance.

Print | 
Email |  Comment   Share  
July 15, 2009 - Model STB P300(TM) CMP System includes nVision II(TM) optical and motor current endpoint detection system, Saturn(TM) wafer carrier, Precision(TM) pad conditioner, and integrated cleaning capability. It is available in several configurations to suit needs of semiconductor, data storage, SOI, silicon, and MEMS manufacturing.

(Archive News Story - Products mentioned in this Archive News Story may or may not be available from the manufacturer.)
Original Press release

Strasbaugh
825-T Buckley Rd.
San Luis Obispo, CA, 93401
USA



Strasbaugh Introducing New STB P300(TM) CMP System at Semicon West, July 14-17, 2009


SAN LUIS OBISPO, Calif., July 6 / / - Strasbaugh (OTC Bulletin Board: STRB) announced today that its new STB P300 CMP system will be introduced at Semicon West in San Francisco, July 14-17, 2009.

The P300 is the semiconductor industry's first CMP system designed to incorporate Next Generation Factory principles. It combines the greatest production and process flexibility of any CMP machine on the market with the most advanced CMP technologies available. With industry-leading process performance, integrated state-of-the art wafer cleaning, low cost of ownership, and a capital cost of approximately 50% of the competition, the P300 offers device makers a new and better choice in CMP.

"The P300 is the first CMP machine in the industry designed to meet the demand for leaner, more agile, manufacturing," said Chuck Schillings, Strasbaugh Pres. & CEO. He added, "It provides improved process performance in a high production system that has the flexibility to support high mix, small lot applications - all at a competitive capital cost. The P300 ushers in a new era in CMP process performance, manufacturability, and price." Strasbaugh's P300 is available in several configurations to best suit the unique needs of semiconductor, data storage, SOI, silicon, and MEMS manufacturing.

Several new CMP technologies will be introduced with the P300, including Strasbaugh's revolutionary new nVision II(TM) optical and motor current endpoint detection system, its new generation Saturn(TM) wafer carrier, the Precision(TM) pad conditioner, and industry-proven integrated cleaning.

About Strasbaugh

Strasbaugh has 60 years of leadership in design and manufacturing of advanced surfacing technology for the global semiconductor, silicon, data storage, MEMS, LED, telecommunications and optics industries. Through close alliances with premier manufacturers in these markets, Strasbaugh has developed pioneering technology that has become the standard in polishing and grinding today. With high-quality grinding tools, state-of-the-art prime wafer polishing and chemical mechanical planarization (CMP) systems, as well as advanced wafer carriers and leading edge process technology, Strasbaugh has enabled its customers to realize their performance targets and has built a reputation as a world class manufacturer of innovative, reliable, high-yield surfacing solutions.

CONTACT:

Sarah Okada

Strasbaugh

805-782-5416

sokada@strasbaugh.com

Source: Strasbaugh

Web Site: http://www.strasbaugh.com/

Print | 
Email |  Comment   Share  
Contacts: View detailed contact information.


 

Post a comment about this story

Name:
E-mail:
(your e-mail address will not be posted)
Comment title:
Comment:
To submit comment, enter the security code shown below and press 'Post Comment'.
 



 See related product stories
 Newsletters
Industry Market Trends
Has Got It
  • Latest developments
  • Trends
  • Best practices
  • Opinions & Commentary
Get Ahead. Get IMT.
Subscribe Free Today
Subscribe   View Sample

Your Gateway to a Fast Changing World
Product News Alerts
Receive similar stories and other customized news to keep you in the know on the products shaping industry.
Subscribe Free Today
Subscribe   View Sample
 See more product news in:
Cleaning Products and Equipment
Machinery and Machining Tools
 More New Product News from this company:
Endpoint Detection System optimizes CMP systems.
More ....
 Tools for you
Watch Company 
View Company Profile
Company web site
More news from this company
E-Mail Story
Save Story
Search for suppliers of
Semiconductor Wafer Plating & Cleaning Equipment
Chemical Mechanical Polishing (CMP) Machines
Join the forum discussion at:
Tools of the Trade
Wired In


Home  |  My ThomasNet News®  |  Industry Market Trends  |  Submit Release  |  Advertise  |  Contact News  |  About Us
Brought to you by Thomasnet.com        Browse ThomasNet Directory

Copyright © 2012 Thomas Publishing Company
Terms of Use - Privacy Policy