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Residual Gas Analyzers support Web-based reporting, control.

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Residual Gas Analyzers support Web-based reporting, control.
Residual Gas Analyzers support Web-based reporting, control.
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May 14, 2012 - Quadrupole monitors HPQ3 and HPQ3S are PVD chamber sensors that do not require differential pumping. Able to detect single figure ppm air leaks during PVD process while simultaneously monitoring all gas species in mass range of 1-100 amu, analyzers feature ion source with dual filaments to ensure failure backup and continuous uninterrupted operation. Respectively, HPQ3 and HPQ3S provide data for processes up to total pressure of 1.3e-3 and 1e-2mbar.

MKS Introduces HPQ3/HPQ3S RGAs


(Archive News Story - Products mentioned in this Archive News Story may or may not be available from the manufacturer.)

MKS
Six Shattuck Rd., Dept. T
Andover, MA, 01810 2449
USA



Press release date: May 1, 2012

High Pressure Compact Quadrupole Process Monitors without Differential Pumping

Andover, MA - MKS Instruments, Inc. (NASDAQ: MKSI), a global provider of technologies that enable advanced processes and improve productivity, has introduced the high pressure, compact HPQ3 and HPQ3S Residual Gas Analyzers (RGAs). These RGAs are robust, sensitive and fast PVD chamber sensors that do not require differential pumping. The HPQ3 and HPQ3S employ field-proven technology and the latest innovative electronics platform to create a reliable, less complex RGA sensor that offers greater flexibility and cost efficiency.

The HPQ3 and HPQ3S quadrupole monitors offer the highest levels of automation. The RGAs interface with tool and factory process control using the TOOLweb® RGA sensor platform, a specialized turn-key tool-integration software, that allows complete integration. It provides powerful web-based reporting and levels of control, from passive monitoring of the tool vacuum to process critical go/no go management of individual process chambers.

The HPQ3 and HPQ3S can detect "single figure" parts per million air leaks during the PVD process while simultaneously monitoring all gas species in the mass range of 1-100 amu. The robust and inexpensive ion source is designed with dual filaments to ensure failure backup and continuous uninterrupted operation without the use of a costly consumable electron multiplier detector. The HPQ3 can provide data for processes up to a total pressure of 1.3e-3mbar, while the HPQ3S can be used for specific higher pressure applications up to 1e-2mbar.

About MKS: MKS Instruments, Inc. is a leading, global provider of technologies to power, control, deliver, monitor, measure and analyze advanced processes in high growth markets. Our primary served markets are manufacturers of capital equipment for thin film applications including semiconductor devices, flat panel displays, light emitting diodes (LEDs), solar cells, data storage media and coatings, as well as medical equipment; energy generation and environmental monitoring processes; biopharm and other industrial manufacturing; and university, government and industrial research laboratories.
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