Microscope features laser pulse mode.November 4, 2005 -
LEAP® 3000X expands capabilities of atom probe microscopy to low electrical conductivity samples by adding laser pulse mode to voltage pulse mode of LEAP 3000 Microscope. Voltage pulse mode applications include precipitate composition and distribution, phase/grain boundary analysis, nuclear materials, thin metal films, and interface engineering. Laser pulse mode can be used for ceramics, GMR/TMR devices, thick dielectric films, high-K dielectrics, and high resistivity silicon.
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Original Press release
Imago Scientific Instruments Corporation
6300 Enterprise Lane
Madison, WI, 53719
USA
Imago Scientific Instruments Announces Latest Innovation in Atomic-Scale Microscopy
Madison, WI - August 2, 2005 - Imago® Scientific Instruments introduced the LEAP® 3000X Microscope at Microscopy & Microanalysis 2005 in Honolulu, Hawaii. This breakthrough product expands the capabilities of atom probe microscopy to low electrical conductivity samples by adding laser pulse mode to the voltage pulse mode of Imago's LEAP 3000 Microscope.
"The 3000X offers engineers and scientists the best of both techniques," says Dr. Timothy Stultz, president and CEO of Imago. "The technological capabilities and performance of the voltage pulse mode of the LEAP 3000 have already garnered unqualified references in the US and abroad. It has the largest field of view, fastest data collection rate and the broadest range of specimen materials and geometries of any similar instrument on the market. The addition of laser pulse mode increases the capabilities of the LEAP 3000 in product development, failure analysis, reliability testing and near-line metrology. It also enhances the quality of the data it provides."
Voltage pulse mode applications of Imago's LEAP 3000 Microscope include precipitate composition and distribution, phase/grain boundary analysis, nuclear materials, thin metal films, and interface engineering (diffusion and roughness). The laser pulse mode has particular value for low conductivity samples, such as semiconductor materials. As described in an invited technical paper that Imago presented at Microscopy & Microanalysis 2005, the laser pulse mode of the 3000X can be used for ceramics, GMR/TMR devices, thick dielectric films, high-K dielectrics, high resistivity silicon, ultra-shallow junction dopant profiling and Silicon Germanium.
The laser pulse mode of the 3000X is a separate module. A LEAP 3000 can be retrofitted in the field with a laser pulse module and re-qualified in less than two weeks. A LEAP 3000X system may be ordered from the factory configured with voltage pulse mode or both voltage and laser pulse mode.
About Imago Scientific Instruments Corporation
Imago Scientific Instruments Corporation is the recognized world leader in the development of Nanolytical® tools and solutions for manufacturers, engineers, scientists and researchers involved in the nano-technology revolution. Imago is committed to the sustained advancement of nano-science and continually develops groundbreaking nano-scale solutions to address unique issues facing its clients and partners. Imago has a worldwide customer base and delivers support from a number of locations in the United States, Japan, and Asia Pacific. For more information, see www.imago.com.
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