Inverted Materials Microscope optimizes digital imaging.September 18, 2008 -
Using integrated intelligence, Eclipse MA200 automatically combines captured images with data on observation settings for documentation. With actual field of view of 25 mm, 1X objective lens enables macro observation. Contrast methods include episcopic bright field, episcopic dark field, DIC, simple polarizing, and episcopic fluorescence. Intelligent manual nosepiece outputs objective position and internal magnification data to DS-L2 and NIS-Elements for automatic scale calibration.
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Original Press release
Nikon Inc.
1300 Walt Whitman Road,
Melville, NY, 11747
USA
Nikon Introduces Inverted Materials Microscope, Eclipse MA200
MELVILLE, N.Y., Sept. 10 /- Nikon Instruments, Inc. (www.nikoninstruments.com) introduces the Eclipse MA200, an inverted materials microscope with an innovative design that has been optimized for digital imaging and ergonomic efficiency. The MA200 uses integrated intelligence to automatically combine captured images with data on their observation settings for more comprehensive documentation. Additionally, its new and unique box design allows easy access to the sample on the stage and nosepiece, while making the footprint size one third of the conventional model.
"The design of the MA200 body saves precious bench top space while placing primary controls in front, making it easy to see and access the objective lens and sample and eliminating the stress caused by long hours of operation," said Michael Metzger, General Manager of Sales and Marketing at Nikon Instruments in Melville, New York. "Combined with renowned Nikon CFI60 Optics and a wider range of contrast methods, the MA200 offers greater flexibility and automation, enabling faster analysis."
The MA200 delivers bright, high resolution and high contrast images. The newly developed 1X objective lens enables macro observation with actual field view of 25mm, making it possible to view the whole area of an embedded metallurgical sample. In addition, the MA200 offers a wide range of contrast methods including episcopic bright field, episcopic dark field, DIC, simple polarizing and episcopic fluorescence.
The intelligent manual nosepiece will output the objective position and internal magnification data out to DS-L2 and NIS-Elements for automatic scale calibration. The scales size will automatically be calibrated when the objective magnification is changed. Large image stitching is also possible through the optional stitching function in the NIS-Elements software. Additionally, by combining the Metalo software module (grain sizing and cast iron), the system will be optimal for JIS and ASTM standard compliant metallurgical analysis.
The Eclipse MA200 is the succeeding model of the TME300/200 and the advanced model of the Eclipse MA100.
About Nikon Instruments Inc.
Nikon Instruments Inc is a world leader in the development and manufacture of optical and digital imaging technology for biomedical and industrial applications. Now in its 90th year, Nikon provides complete optical systems that offer optimal versatility, performance and productivity. Cutting-edge instruments include microscopes, precision measuring equipment, digital imaging products and software. Nikon Instruments is the microscopy and instrumentation arm of Nikon Inc., the world leader in digital imaging, precision optics and photo imaging technology. For more information, visit www.nikoninstruments.com. Product-related inquiries may be directed to Nikon Instruments at 800-52-NIKON.
Web site: http://www.nikonusa.com/
http://www.nikoninstruments.com/
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