Field Emission Gun suits 3D research and development.March 5, 2007 -
Eliminating boundaries imposed by existing high vacuum systems, DualBeam(TM) Quanta(TM) 3D FEG features high-current ion column for rapid, site-specific cross-sections of samples to reveal sub-surface structures and features. System's electron source optimizes SEM imaging, while electron beam current enables high throughput spectroscopy.
(Archive News Story - Products mentioned in this Archive News Story may or may not be available from the manufacturer.)
Original Press release
FEI Co.
7451 N.W. Evergreen Pkwy.
Hillsboro, OR, 97124-5830
USA
FEI Announces New FIB/SEM DualBeam - Quanta 3D FEG
HILLSBORO, Ore./February 21, 2007- FEI Company (NASDAQ: FEIC) today released a powerful analytical DualBeam(TM) for advanced 3D research and development, the Quanta(TM) 3D FEG. Combining FEI's latest advances in ion and electron optics and the unique environmental SEM technology of FEI's Quanta family of products, the new system eliminates the boundaries imposed by traditional high vacuum systems. The Quanta 3D FEG expands FEI's range of DualBeam solutions for NanoResearch and Industry, NanoBiology and NanoElectronics.
The advances incorporated in the Quanta 3D FEG provide users with new levels of versatility and flexibility. The system features FEI's high current ion column for rapid, site-specific cross-sections of samples to reveal sub-surface structures and features while the system's advanced electron source design delivers improved SEM imaging. Further, increased electron beam current enables higher throughput spectroscopy.
"While the Quanta 3D FEG expands our customers' boundaries in NanoResearch it also opens new opportunities in industrial markets with applications that can significantly improve the productivity of industrial users and provides life scientists with advanced cryo DualBeam capabilities," commented Bruno Janssens, FEI's Vice President and General Manager of FEI's NanoResearch and Industry Market Division. "Continuing technology innovations building upon FEI's fourteen years of DualBeam leadership have enabled us to respond to the increasing demand for high-throughput applications across a wide range of industries."
The Quanta 3D FEG will be featured in FEI's exhibit at NanoTech 2007 in Tokyo this week (Booth C-30). Visitors to Pittcon in Chicago (February 26-March 1) will be able to experience the features and benefits of the system in person by scheduling a demo in FEI's booth (#4013) or by reserving a demonstration appointment online at fei.com/Pittcon2007.
About FEI
FEI (NASDAQ: FEIC) is a global leader in providing innovative instruments for nanoscale imaging, analysis and prototyping. FEI focuses on delivering solutions that provide groundbreaking results and accelerate research, development and manufacturing cycles for its customers in Semiconductor and Data Storage, Academic and Industrial R&D, and Life Sciences markets. With R&D centers in North America and Europe, and sales and service operations in more than 50 countries around the world, FEI's Tools for Nanotech(TM) are bringing the nanoscale within the grasp of leading researchers and manufacturers. More information can be found online at: www.fei.com.
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