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Evaporation Masks are built for optimal aperture accuracy.

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Evaporation Masks are built for optimal aperture accuracy.
Evaporation Masks are built for optimal aperture accuracy.

December 1, 2005 - Manufactured using Photo ElectroForming and photo-etching techniques, nickel and stainless steel masks combine coplanar rigidity with burr-free aperture edges. Multi-level masks with stepped recesses can also be produced, limiting need for spacer sheets in multiple-sheet sets. Cross-section thickness, where apertures occur, minimizes photo-shadow. Masks are suited for use across various selective vacuum chamber processes.

(Archive News Story - Products mentioned in this Archive News Story may or may not be available from the manufacturer.)
Original Press release

Tecan
30021 Tomas Street, Suite 300
Rancho Santa Margarita, CA, 92688
USA



Multi-Level Evaporation Masks are Robust and Accurate


High-performance evaporation masks, for use across a wide range of selective vacuum chamber processes, have been further enhanced, by leading provider Tecan - combining coplanar rigidity with optimum aperture accuracy.

Using Photo ElectroForming (PEF) and photo-etching techniques, the company produces cost-effective nickel and stainless steel masks which out-perform traditional alternatives. The technique combines low tooling costs with superior tolerances, delivering greater density designs with higher accuracy aperture edges.

Multi-level masks can also be produced, with 'stepped' recesses, limiting the need for spacer sheets in multiple-sheet sets, if required. Similarly, multi-level masks can be produced with the thinnest possible cross-section where apertures occur, to virtually eliminate photo-shadow and optimise process accuracy. The technology also allows selective areas across the mask to remain thicker - assuring coplanarity and operational robustness.

An established ability to fabricate all mask types ensures traditional and new market requirements are catered for from a single source. The company can produce whatever is required, from traditional multi-mask sets, to stepped masks in stainless steel or nickel. The manufacturing techniques cost-effectively cater for development, prototyping, small-, medium- and large-scale production applications - affording consistently accurate results and low-maintenance parts. Frames for any process need can also be supplied.

The PEF process employed by the company at its world-class facility is exceptionally well-refined, producing high-tolerance display masks with burr-free aperture edges and controllable draft angles to ensure optimum print definition.

Typical applications include a wide number of simple and complex micro-engineered electronic components and products, in industrial, aerospace, automotive, medical and pharmaceutical markets. For example, evaporation-depositing gold or silver contacts onto quartz crystal oscillator tracks. They are also used in sputtering and spray processes for the fabrication of similar components onto substrates such as silicon or glass and for the deposition of a wide range of other surface finishes. Display technologies also benefit from employing the masks - such as liquid crystal displays, organic and inorganic light-emitting diode displays, plasma panel displays, vacuum fluorescent displays and field emission displays.

UK Company contact - Jo Windell, Customer Care Director, Tecan, Tecan Way, Granby Ind. Est. Weymouth, Dorset, DT4 9TU. Tel: 01305 765432. Fax: 01305 780194. sales@tecan.co.uk - www.tecan.co.uk

USA Company contact - Noel Cherowbrier, VP International Development, Tecan, 30021 Tomas Street, Suite 300, Rancho Santa Margarita, CA 92688, USA. Tel: 1-877-998-3226 (toll free). Fax: 1-877-990-4700 (toll free). sales@tecan-inc.com - www.tecan-inc.com

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