Endpoint Detection System optimizes CMP systems.May 29, 2009 -
Designed for IPEC 372 and 472 Chemical Mechanical Polishing systems, nVision II Optical Endpoint Detection Upgrade monitors optical, motor current, and pad temperature signals to determine precise endpoint for both metal and thin film CMP applications in semiconductor, data storage, and MEMS manufacturing markets. System includes intuitive software with full color GUI, endpoint recipe creation and implementation, and signal filtering flexibility.
(Archive News Story - Products mentioned in this Archive News Story may or may not be available from the manufacturer.)
Original Press release
Strasbaugh
825-T Buckley Rd.
San Luis Obispo, CA, 93401
USA
Strasbaugh Offers First Ever Optical Endpoint Detection Upgrade for IPEC 372 & 472 CMP Systems
SAN LUIS OBISPO, Calif., May 12 / -- Strasbaugh (OTC Bulletin Board: STRB) announced today the release of the semiconductor equipment industry's first optical endpoint detection upgrade for IPEC 372 and 472 CMP systems. The new product, nVision II, significantly improves the performance and capability of these systems.
"For the first time ever, IPEC 372 and 472 users can upgrade their systems with the industry's most advanced optical endpoint detection technology," said Chuck Schillings, Strasbaugh CEO. "This enables them to extend the useful life of their tools by increasing yields, lowering consumable costs, and facilitating the manufacture of more sophisticated chips. It can be installed in one day and has a very short payback period."
nVision II monitors optical, motor current, and pad temperature signals to determine a precise endpoint for both metal and thin film CMP applications in the Semiconductor, Data Storage, and MEMS manufacturing markets.
Optical endpoint technology is critical to many current CMP processes because it improves process control and provides more consistent process results wafer-to-wafer. Before now, there has been no viable alternative optical endpoint product available for IPEC 372 or 472 CMP systems. IPEC users have been forced to contend with outdated and unsupported Luxtron motor current endpoint systems and the problems that occur when these systems fail.
nVision II offers several key advantages over older Luxtron systems, including optical endpoint capability; intuitive up-to-date software with full color GUI; easy endpoint recipe creation and implementation; signal filtering flexibility; and customer support. In addition, nVision II shortens setup times and reduces consumables usage.
About Strasbaugh
Strasbaugh has 60 years of leadership in design and manufacturing of advanced surfacing technology for the global semiconductor, silicon, data storage, MEMS, LED, telecommunications and optics industries. Through close alliances with premier manufacturers in these high-technology markets, Strasbaugh has developed pioneering technology that has become the standard in polishing and grinding today. With high-quality grinding tools, state-of-the-art prime wafer polishing and chemical mechanical planarization (CMP) systems, as well as advanced wafer carriers and leading edge process technology, Strasbaugh has enabled its customers to realize their performance targets and has built a reputation as a world class manufacturer of innovative, reliable, high-yield surfacing solutions.
Headquartered in San Luis Obispo, CA, Strasbaugh supplies equipment worldwide through direct and representative sales and service offices located in the U.S., China, France, Germany, Israel, Italy, Japan, Korea, The Philippines, Taiwan, and the United Kingdom.
CONTACT: Sarah Okada of Strasbaugh, +1-805-782-5416, sokada@strasbaugh.com
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