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Dry Film Negative Photoresist is designed for MEMS.

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Dry Film Negative Photoresist is designed for MEMS.
Dry Film Negative Photoresist is designed for MEMS.
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April 16, 2013 - Optimized for hot roll lamination and processing on Micro-Electro-Mechanical Systems (MEMS) and IC wafers, DF-1014 comes in various thickness formats from 5–50 Ám, ▒5% and features glass transition temperature of 145░C and moderate modulus of 4.5 GPa at 25░C. Exhibiting resistance to extreme moisture conditions and corrosive chemicals, cured chemistry can withstand harsh environments. Material formulationáis compatible and can be used in contact with EMS spin coatable photoresists.

Engineered Material Systems Introduces DF-1014 Dry Film Negative Photoresist


(Archive News Story - Products mentioned in this Archive News Story may or may not be available from the manufacturer.)

Engineered Material Systems
132 Johnson Dr.
Delaware, OH, 43015
USA



Press release date: April 1, 2013

DELAWARE, OHá– Engineered Material Systems, Inc., a leading global supplier of negative photo resist materials for MEMs and IC cooling applications, introduces the DF-1014 Dry Film Negative Photoresist for use in Micro-Electro-Mechanical Systems (MEMS). This material formulation has been optimized for hot roll lamination and processing on MEMS and IC wafers.

DF-1014 is available in various thickness formats from 5-50 Ám, ▒5 percent. The cured chemistry can withstand harsh environments including resistance to extreme moisture conditions and corrosive chemicals. The DF-1014 film is tougher (less brittle) than most negative photoresists in the market with a glass transition temperature of 145░C (by DMA Tan Delta) and a moderate modulus of 4.5 GPa at 25C. The cured chemistry is hydrophobic in nature, providing for chemical and moisture resistance.

DF-1014 is compatible with and can be used in contact with the EMS line of spin coatable photoresists. DF-1014 is the latest addition to Engineered Materials Systems’ full line of film and liquid negative photo resists formulated for making microfluidic channels on MEMS devices and integrated circuits.

For more information about the DF-1014 negative photo resists or to learn how Engineered Materials Systems can define, develop and create an engineered material solution that is right for your company, visit www.emsadhesives.com.

About Engineered Material Systems
Engineered Materials Systems, Inc. (EMS) technology focus is on electronic materials for semiconductor, circuit assembly, photovoltaic, printer head, camera module, disk drive and photonics assembly product lines. The company creates continual improvements that will guide its customers into the future. For more information, visit www.emsadhesives.com.
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