Data Management Tool monitors light source parameters.
October 14, 2011 -
Available on Argon Fluoride light sources, SmartPulse(TM) provides wafer-level light source parameter monitoring to enable direct correlation to on-wafer performance for optimum process control and yield. Beam metrology module delivers real-time beam performance data from light source, resulting in comprehensive data set. Supporting Fault Detection Classification requirements, SmartPulse(TM) allows chipmakers to detect excursions which can be managed in real-time.
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|Original Press release |
17075 Thornmint Court
San Diego, CA, 92127
Cymer Unveils SmartPulse(TM) -- Industry's Most Sophisticated Data Management Tool for Light Source Parameter Monitoring
Wafer-Level Light Source Monitoring to Bring Chipmakers Improved Process Control and Higher Yields
SAN DIEGO, -- Cymer, Inc. (Nasdaq: CYMI), the world's leading supplier of light sources used by chipmakers to pattern advanced semiconductor chips, today announced SmartPulse(TM), the next-generation data product following the recently announced OnPulse Plus, that provides chipmakers with additional data collection, reporting and analysis tools. SmartPulse is the first data management tool to provide wafer-level light source parameter monitoring to enable direct correlation to on-wafer performance for improved process control and yield. SmartPulse also introduces a unique beam metrology module that delivers real-time beam performance data from the light source, resulting in a comprehensive data set. Available on Argon Fluoride (ArF) light sources, SmartPulse represents the most sophisticated light source monitoring tool on the market, offering real-time process control monitoring.
"SmartPulse is a direct response to chipmakers' requests for a tool that can provide wafer-level light source data to help them better optimize the lithography process and improve yields," said Ed Brown, president and chief operating officer of Cymer. "In keeping with our commitment to deliver ongoing value enhancements, SmartPulse offers chipmakers a tool unlike any other on the market, enabling lower process variation and higher yields. Unique to SmartPulse, is the capability to support Fault Detection Classification (FDC) requirements -- allowing chipmakers to detect excursions which can be managed real-time, enabling higher quality output."
SmartPulse's unique beam parameter metrology supports the more challenging lithography illumination schemes necessary for multi patterning on advanced nodes. Such complex illumination schemes are particularly sensitive to beam parameters that are only available through SmartPulse's advanced metrology. This first-ever light source metrology can enable tighter process control and enhance on-wafer results.
SmartPulse reinforces Cymer's commitment to supply customers with continuous value enhancements for new and previously installed light sources, building on the company's deep technical expertise and worldwide installed base support infrastructure.
Cymer, Inc. (Nasdaq: CYMI) is the market leader in developing light sources, used by chipmakers worldwide to pattern advanced semiconductor chips, and is pioneering a new silicon crystallization tool for the display industry. Cymer's light sources have been widely adopted by the world's top chipmakers and the company's installed base comprises approximately 3,750 systems. Continuing its legacy of leadership, Cymer is currently pioneering the industry's transition to EUV lithography, the next viable step on the technology roadmap for the creation of smaller, faster chips. The company is headquartered in San Diego and supports its customers from numerous offices around the globe. Cymer maintains a Web site to which it regularly posts press releases, SEC filings, and additional information about Cymer. Interested persons can also subscribe to automated e-mail alerts or RSS feeds. Please visit www.cymer.com.