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Crystal-Growing System is built on laboratory scale.

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July 6, 2011 - Designed to manufacture monocrystalline ingots using Czochralski method, CGS Lab is suitable for solar, semiconductor, and optical industries as well as for basic research at institutes and universities. System offers full process automation and is controlled via integrated GUI. CGS Lab is particularly suitable for material characterization for receiving and pre-delivery inspections and standardization, and for optimization of solar cell material, concentrator photovoltaics, and IR optics.
Original Press release

PVA Tepla America, Inc.
251 Corporate Terrace
Corona, CA, 92879
USA



New Crystal-growing System on a Laboratory Scale


WETTENBERG, Germany, -- PVA TePla Group, a leading manufacturer of silicon crystallization systems and of vacuum and high-temperature systems, has developed the "CGS Lab", a technologically innovative crystal-growing system on a laboratory scale. The CGS Lab, built in the context of the "Spitzencluster" competition sponsored by the German Federal Ministry of Education and Research, is designed to manufacture monocrystalline ingots using the Czochralski method.

In contrast to its larger counterparts, which are already in use in the semiconductor and photovoltaic industries, this system is particularly attractive both for industrial application in the solar, semiconductor and optical industries and for basic research at institutes and universities as a result of its smaller scale.

The CGS Lab is particularly suitable for fast and efficient material characterization for receiving and pre-delivery inspections and standardization, e.g. for polysilicon manufacturers and photovoltaic companies, but also for optimization of solar cell material (Si, Ge), concentrator photovoltaics and infrared optics.

The advantages of the system are its low space requirement and short process times with low staff, material, media and energy utilization levels, which enable fast, cost-efficient results. These are supplemented by low maintenance requirements, ease of use and full process automation. Control of all parameters is possible at any time via an integrated, graphical user interface.


http://www.pvatepla.com
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