Automatic Spectroscopic Ellipsometer operates at high speeds.September 12, 2011 -
Equipped with automatic R-Theta stage, UNECS-3000A measures thickness and refractive index of transparent or semi-transparent thin film. Automatic mapping function can handle 300 mm dia wafer substrates, and non-contact instrument can measure 106 points on 300 mm dia wafer within 120 sec. Max measurement speed is 20 ms/point, and other features include automatic height adjustment, editable materials table file, and ability to concurrently analyze up to 6 layers of film thickness.
Original Press release
Ulvac Technologies, Inc.
401 Griffin Brook Dr.
Methuen, MA, 01844
USA
ULVAC Develops and Commercializes Automatic High-Speed Spectroscopic Ellipsometer 'UNECS-3000A'
Chigasaki, Japan - ULVAC, Inc. is pleased to announce that it has developed and will begin sale of the "UNECS-3000A" Spectroscopic Ellipsometer, which can measure the thinness of a thin film and optical constant.
Background
A spectroscopic ellipsometer is a high-precision measurement instrument that uses the principal of ellipsometry to measure the thickness and refractive index of a transparent or semi-transparent thin film without making contact, and is an instrument that is used widely in a large number of fields such as the semiconductor and liquid crystal display industries.
Ulvac, Inc. first released the "UNECS-2000" compact, high-speed spectroscopic ellipsometer last September to favorable reviews.
This spectroscopic ellipsometer "UNECS-2000" has a compact sensor and performs measurements at a higher speed which was difficult to achieve with the previous spectroscopic ellipsometer. Commercialization of a product equipped with an automatic mapping function to measure the thickness distribution of the substrate surface and support 300 mm diameter wafer substrates was expected as a next new product.
Overview
The "UNECS-3000A" automatic high-speed spectroscopic ellipsometer to go on sale combines the ultra-fast measuring capabilities of "UNECS-2000" high-speed spectroscopic ellipsometer with an automatic mapping function that can handle 300 mm diameter wafer substrates, thus enabling greatly enhanced measurement of film thickness distribution. For example, it takes just 120 seconds to measure 106 points on a 300 mm diameter wafer. This is less than one fifth time for conventional products from other companies, meaning dramatic time savings on film thickness distribution evaluation. The "UNECS-3000A" is extremely versatile and can be used for purposes such as evaluating resist film thickness for semiconductor lithography and organic EL display film, and in a wide range of settings including on production lines and in research and development. Product features are described below.
(1) Automatic mapping function
The product is equipped with an automatic R-Theta stage that can support a maximum 300 mm diameter wafer substrate which can automatically measure the thickness of the substrate surface and optical constant distribution and display the measurement results on a color map.
(2) Ultrahigh-speed measurements
This product can achieve ultra-high-speed measurements (maximum speed of 20ms/point) with the snapshot measurement by using spectroscopic ellipsometry with two high-order retarders which was impossible for the previous spectroscopic ellipsometer.
(3) Cost performance
This product offers incredible cost performance because it comes standard with a lot of functions such as 300 mm diameter wafer automatic mapping, automatic height adjustment, etc., a lap-top computer, analysis software, and other equipment.
(4) Editable materials table file
The materials table file, containing optical constants for substrates and films, can be edited and added to by users, enabling the easy creation of user-unique databases.
(5) Multi-layer film measurements
Up to six layers of film thickness can be analyzed at one time. (Film thickness and optical constants can be measured simultaneously only for the upper layer of film.)
Sales Objectives and Price
The Price of "UNECS-3000A" automatic high-speed spectroscopic ellipsometer will be 15,000,000 yen (which includes the main unit, controller, and computer). We expect to sell 20 units during the first year.
The "UNECS-3000A" automatic high-speed spectroscopic ellipsometer was shown at the Japan Vacuum Show 2011 held August 31 (Wed.) to September 2 (Fri.) at the Tokyo Big Sight (West Hall 1, Booth No. 8) and at the JAIMA EXPO 2011 from September 7 (Wed.) to 9 (Fri.) held at Makuhari Messe.
About ULVAC
ULVAC (Ultimate in Vacuum), Inc. (TSE: 6728) has been a leader in vacuum technology industry since its establishment in 1952. The company has always provided lines of equipment and production systems that form the core of state-of-art production processes in the areas of flat panel display, solar cell, semiconductor and electronics. The company has not only provided equipment but also materials, analysis, evaluation and other services, which are integrated into ULVAC Solutions. For more information, please visit www.ulvac.co.jp/eng.
Contact:
ULVAC, Inc. Components Division
TEL: +81-467-89-2261
FAX: +81-467-89-2267
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