SiC Ceramic helps extend semiconductor equipment life.
November 10, 2006 -
Targeted for semiconductor processing equipment manufacturing, Performance Silicon Carbide (SiC) is manufactured utilizing chemical vapor deposition (CVD) process. Available in ultrapure and low electrical resistivity grades, material properties include high purity, stiffness, thermal shock resistance, and thermal conductivity. Low electrical resistivity Performance SiC, when used in heating elements and susceptors, provides heating uniformity inside processing chamber.
(Archive News Story - Products mentioned in this Archive News Story may or may not be available from the manufacturer.)
Morgan Advanced Ceramics Offers Performance SiC for Semiconductor Processing Equipment
Extending the life of manufacturing equipment, reducing downtime and eliminating contamination
Morgan Advanced Ceramics, a leading manufacturer of innovative ceramic, glass, metal and engineered coating solutions, offers Performance Silicon Carbide (SiC) for semiconductor processing equipment manufacturing. Performance SiC is available in two grades, ultrapure and low electrical resistivity. Utilizing an advanced chemical vapor deposition (CVD) manufacturing process, both ultrapure and low electrical resistivity Performance SiC, outperform conventional materials in hostile chemical and plasma environments. The superior properties of Performance SiC - high purity, stiffness, thermal shock resistance and thermal conductivity - make it ideal for a variety of demanding semiconductor processing applications.
Traditionally, Performance SiC has been used in rapid thermal processes (RTP) and single-wafer CVD processes, which take advantage of the material's excellent thermal shock resistance and resistance to erosion by high energy plasmas. Low electrical resistivity Performance SiC is used in heating elements and susceptors, improving heating uniformity inside the processing chamber. Performance SiC is also well-matched for optical molds, gas distribution plates, edge rings, heaters, plasma etch chamber components, electrostatic chucks or any application that requires electrical conductivity, wear resistance and thermal shock resistance.
Reducing warranty costs, parts made of Performance SiC last longer than those made of other materials. The high purity of Performance SiC minimizes the risk of contamination. It creates faster throughputs and cycle times and reduces downtime for semiconductor manufacturers.
About Morgan Advanced Ceramics
Morgan Advanced Ceramics (MAC) has a comprehensive range of Ceramic materials, from which its products are manufactured. Supplying to a variety of demanding markets, MAC has established an enviable reputation for providing value-added solutions through world-class research and development, innovative design and, perhaps most important of all, application engineering.
As a subsidiary of The Morgan Crucible Company, MAC forms part of the Morgan Technical Ceramics Group. The Group includes Morgan Electro Ceramics and from manufacturing locations in North America, Europe and Asia, it supplies an extensive range of products, including ceramic components, braze alloys, ceramic/metal assemblies and engineered coatings.
For more information on Morgan Advanced Ceramics visit www.morganadvancedceramics.com or contact one of our sales offices below:
Morgan Technical Ceramics Inc
26 Madison Road, Fairfield
NJ 07004, USA
Tel: 1 800 433 0638
Fax: 1 973 808 2257
Email: ussales@morganadvancedceramics.com
Asia
Morgan Technical Ceramics
158 Jiajian Road, Jiading
Shanghai 201818, People's Republic of China
Tel: +86 21 5990 0687
Fax: +86 21 5990 3241
Email: mmsh@sh163.net
Contacts:
Public Relations:
Gray & Rice Public Relations
Kerry McDermott
USA
Phone: 617-367-0100 ext 103 E-mail this person Company Information: Name: Morgan Technical Ceramics Address: 26 Madison Rd. City: Fairfield State: NJ ZIP: 07004 Country: USA Phone: 973-227-8877 FAX: 973-227-7135 http://www.morgantechnicalceramics.com
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