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Commercial Photomasking uses photoimageable color polymer.
November 20, 2007 -
Multifaceted microlithography techniques pattern photoimageable color polymer-coated substrates using direct-write laser, direct-write e-beam, optical reduction, and full field exposure lithography. Photoimageable color polymers provide means of producing microscopic patterns in various standard colors as well as custom polymer colors. Line widths can be produced as small as 2 microns in color polymers, offering compatible with nanoscale applications.
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Photo Sciences Introduces New Photoimageable Color Polymer on Substrates Using Commercial Photomask Lithography and Micro Patterning
In November 2007 Photo Sciences successfully introduced a new process and procedure to enable substrates to be coated with photoimageable color polymers for processing in its commercial photomask lithography and micro patterning perations.
Photo Sciences uses its multi-faceted microlithography techniques to pattern photoimageable color polymer coated substrates using direct-write laser, direct-write e-beam, optical reduction and full field exposure lithography. This commercial photomasking process is often used for filters or as projection reticles such as gobos. The photoimageable color polymers deliver a high quality means of producing microscopic patterns in various standard colors such as red, blue and green but a wide array custom polymer colors can be developed when necessary. Photo Sciences has successfully produced line widths as small as 2 microns in the color polymers making it workable with nano scale applications. Photo Sciences uses state-of-the-art measurement and test equipment to ensure that the photoimageable color polymers meet microscopic thickness and spectral requirements. The use of proprietary multi-level aligning exposure systems ensures that the multiple layers of colored polymer patterns can be aligned to one another to create a wide array of color and pattern configurations on a variety of substrates.
More information on Photo Sciences Inc and its range of commercial photomask and other micro patterning solutions can be found on www.photo-sciences.com
About Photo Sciences
Photo Sciences Specializes in a complete range of commercial photomasks, chemical milling and micro patterning solutions with optional substrate coating using color polymers and Indium Tin Oxide. Founded in 1972 Photo Sciences Inc services all major industry sectors such as Defense, Medical, Automotive, Electronics, and telecommunications. Photomasks are used in wide range of semi conductor, custom, and nano scale applications such as near permanent projection graphics, glass motion control components, microscope/eye piece reticles, focusing tools, calibration instruments, deposition & evaporation masks, and light & fluid apertures.
The company is ISO 9001: 2000 certified, RoHS and WEEE compliant.
For more information, please contact Photo Sciences at (310) 634-1599 or visit www.photo-sciences.com or email Roger Horstman, rogerh@photo-sciences.com
Company Information:
Name: Photo Sciences, Inc.
Address: 2542 West 237th St.
City: Torrance
State: CA
ZIP: 90505
Country: USA
Phone: 310-784-7460
FAX: 310-784-3642
http://www.photo-sciences.com
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