Archive News Story
(Products mentioned in this Archive News Story may or may not be available from the manufacturer.)
Deposition System processes 6 in. dia or smaller wafers.
August 10, 2007 -
Able to process up to 100 wafers, EasyTube 6000 Chemical Vapor Deposition system is available with Atmospheric and Low-Pressure Chemical Vapor Deposition processes for research applications in semiconductor, MEM, nanotechnology, and solar cell markets. Multi-tube horizontal system is equipped with WINPRC real-time software to enable optimization of all process parameters and is designed specifically for research, university, and laboratory markets.
Archive Press Release
(Products mentioned in this Archive Press Release may or may not be available from the manufacturer.)
Release date: August 2, 2007
First Nano Ships the First of Our EasyTube 6000 Series Deposition System Specifically Designed for the Research and University Laboratory Market
RONKONKOMA, N.Y., Aug. 2 / / -- First Nano, a division of CVD Equipment Corporation (AMEX:CVV) has announced today the shipment of our first EasyTube 6000 Chemical Vapor Deposition system. The multi-tube EasyTube 6000 horizontal system is specifically designed for the Research, University and Laboratory market and is capable of processing up to 100 - 6" diameter or smaller wafers. The system is available with processes for research applications in the Semiconductor, MEM, Nanotechnology and Solar Cell markets.
The EasyTube 6000 is another addition to our line of EasyTube systems that are aimed at offering the research community quality performance, safe operation and production grade equipment at a low cost of ownership. All EasyTube systems are equipped with our proprietary WINPRC real-time software to enable optimization of all process parameters. The EasyTube 6000 has a small footprint, is modular in design and is offered with Atmospheric and Low- Pressure Chemical Vapor Deposition processes.
In the fourth quarter of 2007, we will be installing an EasyTube 6000 in our "Open Laboratory" to further our ongoing relationships with the research community. The system will be used for customer demonstration, material processing and developing additional processes for CNT, Solar and MEM applications. The system will give us nine (9) operational deposition systems in our laboratory for further product and materials development.
Source: CVD Equipment Corporation
CONTACT: Karen Hamberg of CVD Equipment Corporation, +1-631-981-7081, or Fax, +1-631-981-7095, or info@cvdequipment.com
Web site: http://cvdequipment.com/
Contacts:
General Information:
Karen Hamberg
USA
Phone: 631-981-7081
FAX: 631-981-7095 E-mail this person Company Information: Name: CVD Equipment Corp. Address: 1881 Lakeland Ave. City: Ronkonkoma State: NY ZIP: 11779 Country: USA Phone: 631-981-7081 FAX: 631-981-7095 http://www.cvdequipment.com
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